Nano-imprinting lithography
Nano-imprinting lithography is carried out by using the SUSS Microtech facility. The facility allows us to process silicon wafers up to 150 mm in diameter. It is equipped with a very high positioning accuracy stage, with a optical alignment system, and with an apparatus for in-situ polymer deposition. The facility can emboss by using a force as high as 50 N at a temperature of 400 °C.
Staff contact: Salvatore Di Franco
