| General The main objective of
the symposium is to bring together specialists who work in the
field of dielectrics and all aspects of their applications in
the field of microelectronics. The forum is intended to provide
an overview of the state of the art in this significant field,
and to promote a relatively informal atmosphere for the discussion
of the latest research results. The workshop deals with a range
of issues in the field of advanced and new dielectrics, such
as: growth and deposition, modelling and simulation, physical
and electrical properties, reliability and dielectric applications. |
 |
The 14th workshop will be hosted by CNR - IMM in June 2006
Venue: Hotel Santa Tecla Palace
Dates: 26-28th June, 2006
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We invite you to submit an abstract for oral or poster presentation in one or more of the following areas:
- High-k dielectrics: deposition, characterisation, integration, high-k/metal gates …
- Low-k dielectrics: deposition, characterisation, integration …
- SiO2 and oxynitrides: Growth, characterization, reliability, radiation effects and applications.
- Circuit implications of oxide breakdown
- Simulation and modeling related to dielectric issues.
- Non volatile memories based on novel concepts (nanocrystals, SONOS,
NROM, PCRAM, etc.)
- Defects in gate dielectrics and their interface with semiconductors.
- Dielectrics on alternative substrates (Ge, SiGe, SiC and III-V compounds)
- Reliability, electrical and physical characterisation of thin and thick dielectrics.
- Dielectrics in MIM capacitors, MEMS and sensors
- Ferroelectrics for memory applications
- Oxidation of IV-IV alloys (such as SiGe, SiC). Properties and reliability
- Silicon on insulator dielectric studies
- Light emission from Si/SiO2 superlattices and nanoclusters in dielectrics
- Dielectrics in sensor applications
- Sufi Zafar, IBM, Yorktown
Experimental and modeling study of NBTI in oxide and high k pFETs
- Gilles Reimbold, CEA-LETI, Grenoble
t0 and PBTI-induced traps and charges in HfO2/TiN stacks
- Paul Zimmerman, Intel, Santa Clara
Integration of high k with Ge and IIIV Ultimate CMOS scaling for digital logics
- Ben Kaczer, IMEC, Leuven
Gate oxide breakdown in FET devices and circuits: From nanoscale physics to system-level reliability
- Giuseppe La Rosa, IBM, Fishkill
Hot carrier effects in advanced CMOS technologies
- Alex Demkov, University of Texas at Austin, USA
Ab initio theory of CMOS gate stacks with high-k dielectrics: stability, inter-diffusion,
compensation and band alignment
- Francesco Priolo, University of Catania
Silicon nanostructures in dielectric for microphotonics
- Roberto Bez, STM, Agrate
Phase Change Memory: a promising non volatile memory technology for the next decade
- Chadwin Young, SEMATECH, USA
Electrical Characterization Techniques for the High-k Era
- Robert Steimle, Freescale, Austin
Silicon Nanocrystals: Fundamental Physics and Memory Technologies
Please download the programme file
Guidelines for Abstract Submission
SUBMISSION DEADLINE: April 6th, 2006
Abstract Submission
-
Please send your 2 page abstract (including figures) preferably by e-mail (MS Word or pdf file) abstract-wodim2006@imm.cnr.it, or normal mail to the Chair (no fax submissions). Please state your preference for oral or poster presentation. Submissions will be acknowledged and final notification will be sent by May 4thl, 2006. Extended contributions will be considered for publication in a special issue of Microelectronics Reliability journal published by Elsevier. Extended contributions are to be submitted during the Workshop.
Oral Presentations
- 20 minutes: 15
minutes for presentation, and 5 minutes for questions
- Video projection
will be available. WoDiM 2006 preference is for video projection.
- Presentations in Powerpoint
or PDF (Adobe Acrobat).
- Please email a copy of your presentation (power point or pdf) to abstract-wodim2006@imm.cnr.it by 21st June.
- Please meet your
session chair prior to your session.
Posters
- Display boards provided
- Dimensions of poster board: Height 1200 mm Width 900 mm
- Presenting authors can use posters or separate A4 sheets.
- Materials to attach posters will be provided.
Extended Abstract
-
You are also invited to prepare a 4-page extended abstract for the workshop proceedings, which will appear in a special issue of Microelectronics Reliability. A template for preparation of the 4-page paper is attached to the acceptance email sent by May 4th, 2006. Please submit a paper and soft copy of your extended contribution at the workshop.
Any questions ?: Please email to wodim2006@imm.cnr.it
Please follow the instructions below:
(1) Dowload form
(2) Fill it
(3) Submit abstract + filled form to abstract-wodim2006@imm.cnr.it
(4) You will receive a confirmation number (acknowledgement of receipt)
by e-mail at the address indicated in the form.
- Abstract submission deadline: April 6, 2006
- Notification of abstract acceptance: May 4, 2006
- Deadline for Advanced Registration / Hotel reservation: May 10, 2006
- Copy of the presentations: June 21, 2006
- Conference: June 26-28, 2006
- Paper Submission Deadline: August 30, 2006
Please follow the instructions below:
(1) Dowload form
(2) Fill it
(3) Send by fax to Hotel Santa Tecla Palace ( Fax +39 095 607705 )
(4) You will receive confirmation
by fax or e-mail.
- Gérard Ghibaudo
IMEP, ENSERG, Grenoble, France
- Emmanuel Vincent
STMicroelectronics, Crolles, France
- Gabriella Ghidini
STMicroelectronics, Agrate, Italy
- Blas Garrido Fernandez
Universitat de Barcelona, Spain
- Hans-Joachim Muessig
IHP, Frankfurt (Oder), Germany
- Andreas Martin
Infineon Technologies AG, Muenchen, Germany
- Eric M. Vogel
National Institute of Standards and Technology, Gaithersburg, MD, USA
- Paul Hurley
Tyndall National Institute, University College Cork, Ireland
- Gérard Sarrabayrouse
LAAS-CNRS, Toulouse, France
- Montserrat Nafría Maqueda
Universitat Autonoma de Barcelona, Spain
- Anton Bauer
Fraunhofer Institute of Integrated Systems and Device Technology, Erlangen, Germany
- Alessandro Paccagnella
Università di Padova, Italy
- Jasmine Petry
Philips Research, Leuven, Belgium
General Chair
Salvatore
Lombardo,
WoDiM 2006
CNR-IMM,
Stradale Primosole, 50
95121, Catania, ITALY
Tel: + 39 095 5968 223
Fax: + 39 095 5968 321
email:salvatore.lombardo@imm.cnr.it
- Emanuele Rimini
University of Catania
- Giuseppe Ferla
STMicroelectronics
- Orazio Puglisi
University of Catania
- Corrado Spinella
CNR-IMM
- Salvatore Coffa
STMicroelectronics
- Giuseppe Falci
University of Catania
- Gaetano Palumbo
University of Catania
For abstract, presentations, and related issues, please contact the General Chair.
For other matters, please contact:
Consorzio Catania Ricerche,
Via A. di Sangiuliano, 262 - 95124 Catania, Italy; Phone: +39 095
313341; Fax: +39 095 313763: E-mail: Catania.Ricerche@unict.it
The 14th Workshop on Dielectrics in Microelectronics (WoDIM), continues a series of workshops which started in Cork (NMRC) in 1989, and is focussed on the basic science and applications of dielectric materials. Details of the previous meeting are given below:
1989 Cork
1990 Bari
1991 Bordeaux
1992 Cork
1993 Cork
1994 Cork
1995 Heraklion
1996 Venice
1998 Toulouse
1999 Barcelona
2000 Munich
2002 Grenoble
2004 Cork
The workshop was an annual event until
the 2000 Workshop in Munich, after which the workshop became a biannual
meeting. The last Workshop in Cork, Ireland in 2004 attracted 130 participants
from Europe, America and Asia, with 8 internationally recognised experts
as invited speakers.
How to reach the Santa Tecla Palace
From the Airport to the S.Tecla Palace (please download the map of the meeting point at the airport)
- 25 june two shuttles: 16:30 and 21:00
From the S.Tecla Palace to the Airport
- 28 june one shuttle only: 14:30
http://www.sicilyincoming.it/uk/escursioni/mini.htm
For further information please contact the Santa Tecla Palace Staff .
