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The IMM – Naples Micro/nano Fabrication Clean Room is a multidisciplinary facility dedicated to research and development of nanotechnology, bio-sensing applications, photonic and microelectronic devices. 

It’s a 200 sqm ISO 5 / 6 Clean Room equipped with the main technologies for micro and nano scale devices fabrication. Inside it is present an ultra-pure water system, a chemical storage box, a semiconductor grade Gas N2 and vacuum distribution system. Outsise, in the external thecnical room, there are the ultra pure gas boxes, a bi-osmotic water production system and a water cooling system to service all the technological systems inside the Clean Room.

This laboratory supports the research activities of the IMM – Naples scientific group, allows the scientific collaboration with international high-tech industries and houses Ph.D students and Post-Doc from the most important national and international universities.

The Clean Room is organized in 5 different technological areas, each dedicated to a specific processing applications.

 

 

GROWTH, DEPOSITION AND THERMAL PROCESSES
This area is dedicated to thin film synthesis and includes the main technologies for the deposition of III-V semiconductors, dielectric and metallic materials, for thermal growth and annealing and in general for samples and devices fabrication. It is equipped with a range of technologies such as two different PECVD systems, a four cathode Sputtering System, Thermal and e-Beam evaporator. This area also include equipments for Rapid Thermal Annealing and Silicon Oxidation. 
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WET AND DRY ETCHING
 

This technological area is mainly dedicated to etching processes, wet and dry, of the materials. The dry etching equipment includes two different RIE system, an HV ICP-RIE for high aspect ratio etching and a RIE system for standard etching processes and for surface treatment. This laboratory is utilized also for the pre-processing substrate cleaning, with wet chemical benches for standard RCA procedure and/or for post-processing wet chemical etching. This lab includes also a cell for electrochemical etching of silicon dedicated to porous silicon fabrication and a flow laminar bench for the fabrication of microfluidic chips PDMS based

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OPTICAL AND LASER LITHOGRAPHY
The Laboratory is an ISO 5 clean room that includes facilities for Photolithography processes.
The fabrication set consists in a Mask Aligner, with Bottom Side Alignment option and a maximum resolution of 1 μm in i-line exposure,  an automatized coating system, with spin coater and hot plate, and a vertical laminar flow wet bench for developing steps.
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NANOLITHOGRAPHY
In the CNR Area 3 Pozzuoli (Na) is located the Electron-Beam NanoLithography Laboratory. It’s a ISO 5 clean room and includes a Scanning Electron Beam Lithography System , RAITH 150 (the system is a joint property between IMM-Na and ISASI-CNR). The laboratory includes also a Laser Pattern generator for optical lithography and a customized (patented) optical fiber spin coater. 
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