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In Naples Unit, standard microelectronic techniques are merged with liquid synthesis processes and surface modification strategies in order to obtain nanostructured materials with advanced properties for photonics, sensing and medicine. Materials are realized using the facilities described in the following.

 

Sputtering

 

Magnetron sputtering LS300 SISTEC system equipped with four completely independent target, 4” dia, connected to four different power supplies, 2 RF, 1 DC-pulsed and 1 DC. It’s possible to deposit 4 different material at the same time, to operate in co-sputtering mode and in reactive mode by using O2 process gas. Min. pre-process pressure E -8 mbar, operative temperature range t.a. up to 550 °C, Ar and O2 process gas.

Dielectric and metal materials such as a-Si, SiC, Si3N4, NiCr, ZnO, ITO, Ti, Li3NbO4, Al2O3, Al, SiO2, Er can be deposited.

 

 

Contact: Mariano Gioffrè

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Evaporator systems

 

  1. Thermal evaporator EMTecnoservices operating up to 400 °C for deposition of Au, Al, Cu, Pd, Pt, Ag, Cr, Ni.
  2. E-beam evaporator SISTEC operating at a temperature up to 300 °C with a 10 KW power supply and equipped with a cryogenic pump; the system is dedicated to the deposition of Al and Ti.

 

Contact: Maurizio Casalino, Mariano Gioffrè

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Plasma-enhanced chemical vapor deposition (PECVD)

 

PlasmaLab 80 OXFORD is a plasma system with two vacuum chambers, one with a PECVD reactor and the other one with a RIE reactor. SiH4, NH3 and O2 are gases used in the PECVD processes to deposit silicon nitride and amorphous silicon; it operates with a heated stage up to 350 °C. CF4, CHF3, O2 are used in the RIE chamber to etch silicon nitride and silicon oxide. O2 plasma is used in the RIE chamber to clean and/or to activate surfaces.

 

 

Contact: Giuseppe Coppola

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“Functional nanomaterials and interfaces” laboratory

 

Laboratory for wet chemistry equipped with: refrigerated centrifuge, ultrasonic apparatus, inert atmosphere glove box, precision balance, filtration system, vortex mixer. Laboratory is dedicated to gold nanoparticles synthesis (nanospheres, nanorods), porous semiconductor nanoparticles production and surface modifications by chemicals and biomolecules.

 

 

 

Contact: Ilaria Rea

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