Influence of nanowire template morphology on the coalescence overgrowth of GaN nanowires on Si by molecular beam epitaxy

Data di pubblicazione: 27 Feb 2012

ConvegnoFonte dati: ARCHIVIO

GaN nanowires are grown on Si(111) as templates for pendeoepitaxial coalescence overgrowth under different V/III ratios by molecular beam epitaxy. The degree of coalescence in the nanowire template increases with decreasing V/III ratio or doping with Mg. The morphology of the GaN nanowire template strongly influences that of the pendeoepitaxial layer after coalescence as well as its optical quality.

Editore
International Society for Optics and Photonics
Fonte
Gallium Nitride Materials and Devices VII
ID archivio
bc79356d42944f7e7bdec2edddd1385a
Riferimenti
Volume: 8262 Pages: 82620P