Raman Stress Characterization of Hetero-Epitaxial 3C-SiC Free Standing Structures

Data di pubblicazione: 28 Mar 2011

ConvegnoFonte dati: OPENALEXTipo OpenAlex: articleOpen Access
Autori: Nicolò Piluso, Massimo Camarda, Ruggero Anzalone, Andrea Severino, Antonino La Magna, Giuseppe D'Arrigo, Francesco La Via

Raman microscopy has been used to study the stress distribution on 3C-SiC/Si (100) micro-machined free standing structures. Linear scans along different structures reveal similar trends of the TO mode Raman Shift. We have found that, independently of the microstructure considered, the Raman frequency decreases close to the undercut. We compare our experimental measurements with FEM simulations finding that, close to the undercut, the stress tensor becomes non-diagonal, modifying the Raman shift to stress relation.

Editore
Trans Tech Publications Ltd
Fonte
Materials Science Forum
Volume
679-680
Pagine
141-144
Citazioni
8
ID archivio
a49edf27a162e7c8af1e4bc4ccd8aacf
Riferimenti
Volume: 679 Pages: 141-144