Near- and far-infrared absorption and electronic structure of Ge-SiGe multiple quantum wells

Data di pubblicazione: 15 Nov 2010

RivistaFonte dati: OPENALEXTipo OpenAlex: articleAccesso chiuso
Autori: Yan Busby, M. De Seta, Giovanni Capellini, F. Evangelisti, Michele Ortolani, Michele Virgilio, Giuseppe Grosso, Giovanni Pizzi, P. Calvani, S. Lupi, Michele Nardone, Giuseppe Nicotra, C. Spinella

We report an extensive study of strained Ge/Si 0.2 Ge 0.8 multiquantum wells grown by ultrahigh-vacuum chemical-vapor deposition. The microstructural properties of the samples were characterized by transmission electron microscopy and Raman spectroscopy. Their electronic properties have been investigated by means of infrared absorption measurements. Both interband and intersubband transitions were analyzed. Intersubband absorption energies were found in the 20–50 meV range, depending on the quantum well width. Interband and intersubband transition energies have been successfully described by means of both a k⋅ p approach and a tight-binding model. In particular, we found a conduction-band offset between the L edges of 124 meV, well suited for the development of optoelectronic devices operating in the terahertz range. We also found that the energy difference between the Δ 2 minima in the …

Editore
American Physical Society
Fonte
Physical Review B
Volume
82
Fascicolo
20
Citazioni
44
ID archivio
3f59d8d1a48b409e50053892411fb2ae
Riferimenti
Volume: 82 Issue: 20 Pages: 205317