Ge Quantum Dots Embedded in SiO2 or SiNx: Synthesis and Light Absorption

Data di pubblicazione: 1 Ago 2011

RivistaFonte dati: OPENALEXTipo OpenAlex: conference-abstractOpen Access
Autori: Salvo Mirabella, Salvo Mirabella, Antonella Gentile, Salvo Cosentino, Nicolò Piluso, Giuseppe Nicotra, Emilia M. Esposito, M. Camalleri, F. Simone, Antonio Terrasi

Innovative materials and quantum structures are required to increase the efficiency of PV cells. Beyond Si quantum dots (QD), Ge nanostructures begin to attract a growing attention because of lower melting point and energy gap with respect to Si. Moreover, the larger excitons Bohr radius in Ge (~ 20 nm, quadruple than in Si) would permit to exploit the confinement effect at a larger size with respect to Si.Recently, Ge QDs embedded in SiO2 have been realized by deposition of a SiGeO alloy layer (by magnetron co-sputtering) followed by thermal annealing up to 800 C. Such Ge QDs showed an optical bandgap of 1.6 eV, well higher than that of not-confined Ge (~ 0.7 eV), but independent of the QDs size [1]. At the same time, a strong relation between the QDs size and the absorption probability has been evidenced, pointing out that the photon absorption can be mediated by electronic states localized at the surface …

Editore
IOP Publishing
Fonte
ECS Meeting Abstracts
Volume
MA2011-02
Fascicolo
29
Pagine
2015
Citazioni
0
ID archivio
81c619184d37e967157ff195e469e116
Riferimenti
Issue: 29 Pages: 2015