Detailed investigation of the influence of the process parameters on the nano-morphology of Ag deposited on SiC by radio-frequency sputtering

Data di pubblicazione: 15 Ago 2011

RivistaFonte dati: OPENALEXTipo OpenAlex: articleAccesso chiuso
Autori: Maria Grazia Grimaldi, Francesco Ruffino, M. G. Grimaldi

In this work, a detailed study of the influence of the synthesis parameters (deposition time t and emission current I) on the morphological properties of Ag nanoparticles sputter-deposited on silicon carbide is carried out. Using the atomic force microscopy technique, we analyzed the evolution of several structural characteristics as a function both of t and I: the length and width of the Ag nanoparticles, the number of nanoparticles per unit area, the nanoparticles’ fraction of the covered area, and the roughness of the resulting Ag film. Using consolidated theoretical frameworks and fitting approaches, the relations between such quantities and the process parameters t and I were established. In particular, the application of the interrupted coalescence model allowed us to evaluate the critical mean island diameter for the partial coalescence process; the dynamic scaling theories of growing interfaces lead, instead, to the …

Editore
American Institute of Physics
Fonte
Journal of Applied Physics
Volume
110
Fascicolo
4
Citazioni
13
ID archivio
fa65936a09f9054b5b198241f9111bc9
Riferimenti
Volume: 110 Issue: 4 Pages: 044311