I. Gate Stack Scaling

Fonte dati: ARCHIVIO

V. Cosnier, P. Besson, V. Loup, L. Vandroux, S. Minoret, M. Casse, X. Garros, J.-M. Pedini, S. Lhostis, K. Dabertrand, C. Morin, C. Wiemer, M. Perego and M. Fanciulli Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 ‘‘high-j’’and 2 metal deposition techniques 1886

ID archivio
f79d7880feff7d3ef4c4a6a0de0de23a