Interface width evaluation in thin layered CoFeB/MgO multilayers including Ru or Ta buffer layer by X-ray reflectivity

Data di pubblicazione: 16 Dic 2012

RivistaFonte dati: OPENALEXTipo OpenAlex: articleAccesso chiuso
Autori: Alessio Lamperti, Sung–Min Ahn, B. Ocker, Roberto Mantovan, D. Ravelosona

To elucidate in details any possible influence of the adjacent layers on perpendicular magnetic anisotropy in very thin ferromagnetic CoFeB electrodes of CoFeB/MgO based stacks, we grew by sputtering BL/CoFeB (1 nm) and BL/CoFeB (1 nm)/MgO (2 nm), being BL (buffer layer) = Ta (5 nm) or Ru (1 nm) multilayers, consisting of 30 repetitions of the bi- or tri-layers. Specular X-ray reflectivity (XRR) has been performed on both as grown and annealed (300 °C in vacuum) multilayers. From XRR results, good reproducibility of each layer thickness is achieved, indicating a well-controlled film growth. Further, CoFeB/MgO interface is found to be quite smooth and stable with annealing, as shown by the limited interface width, while BL/CoFeB interface widens upon annealing, in particular when BL = Ta is used. We discuss the above findings, also considering the role of possible layer crystallinity in affecting the interface …

Editore
Elsevier
Fonte
Thin Solid Films
Volume
533
Pagine
79-82
Citazioni
17
ID archivio
8d8af0d987bea72d87dc55c8195222b8
Riferimenti
Volume: 533 Pages: 79-82