Interstitial Diffusion Influence upon Two-Dimensional Boron Profiles

Data di pubblicazione: 1 Nov 2001

ConvegnoFonte dati: OPENALEXTipo OpenAlex: articleAccesso chiuso
Autori: Filippo Giannazzo, VITO RAINERI, Vittorio Privitera, Francesco Priolo

All rights reserved. No part of contents of this paper may be reproduced or transmitted in any form or by any means without the written permission of Trans Tech Publications Ltd, www.scientific.net. (#528286773, Google Scholar, Switzerland-07/01/20,10:03:41) … 184 Gettering and Defect Engineering in Semiconductor Technology IX … 186 Gettering and Defect Engineering in Semiconductor Technology IX … 188 Gettering and Defect Engineering in Semiconductor Technology IX

Editore
Trans Tech Publications Ltd
Fonte
Solid State Phenomena
Volume
82-84
Pagine
183-188
Citazioni
0
ID archivio
90793f3f66d2f4e91538e0bdbe69fc34
Riferimenti
Volume: 82 Pages: 183-188