Comparison between Different Schottky Diode Edge Termination Structures: Simulations and Experimental Results

Data di pubblicazione: 15 Set 2003

ConvegnoFonte dati: OPENALEXTipo OpenAlex: articleOpen Access
Autori: Francesco La Via, Fabrizio Roccaforte, Salvatore Di Franco, VITO RAINERI, F. Moscatelli, Andrea Scorzoni, Gian Carlo Cardinali

Four different Schottky diode edge terminations have been fabricated on 6H SiC. The metal contact was Ni2Si in all the structures and the epitaxial layer has a carrier concentrations of 3x10 15 cm-3 and a thickness of 4 microns. With these characteristics of the epitaxial layer, the ideal breakdown voltages should be 800 V. In the best structure an edge efficiency of about the 95% has been reached. The comparison between the experimental and the simulated results shows that, when the breakdown is not influenced by defects present in the substrate, a good agreement with the simulation can be reached.

Editore
Trans Tech Publications Ltd
Fonte
Materials Science Forum
Volume
433-436
Pagine
827-830
Citazioni
13
ID archivio
f80ec79ad64dece809401cd7aeda3aa2
Riferimenti
Volume: 433 Pages: 827-830