A kinematical model is proposed to describe X-ray interference phenomena in the symmetric Bragg case from multilamina structures. The formalism is able to represent any desired sequence of crystalline and non-diffracting layers and hence can be used for a variety of experimental situations from heterostructures to implanted single crystals with embedded amorphous layers. Owing to the relevant thicknesses involved in the implant, the analysis of the interference effects by this model is not restricted to the case of very thin embedded layers commonly encountered in heterostructure-based optoelectronic devices. The model is hence of more general validity. Comparison with rocking curves obtained by dynamical treatment of experimental data, relative to silicon implanted in such conditions as to produce buried amorphous layers, shows that all the interference features are well reproduced by the model.