3C-SiC Epitaxy on Deeply Patterned Si(111) Substrates

Data di pubblicazione: 24 Mag 2016

RivistaFonte dati: OPENALEXTipo OpenAlex: articleOpen Access
Autori: Thomas Kreiliger, Marco Mauceri, Marco Puglisi, Fulvio Mancarella, Francesco La Via, Danilo Crippa, Wlodek Kaplan, Adolf Schöner, Anna Marzegalli, Leo Miglio, Hans von Känel

The growth morphology of epitaxial 3C-SiC crystals grown on hexagonal pillars deeply etched into Si (111) substrates is presented. Different growth velocities of side facets let the top crystal facet evolve from hexagonal towards triangular shape during growth. The lateral size and separation between Si pillars determine the onset of fusion between neighboring crystals during growth at a height tailoring of which is crucial to reduce the stacking fault (SF) density of the coalesced surface. Intermediate partial fusion of neighboring crystals is shown as well as a surface of fully coalesced crystals.

Fonte
Materials science forum
Volume
858
Pagine
151-154
Citazioni
11
ID archivio
59c867822904b8b477b741b913dfbde7
Riferimenti
Volume: 858 Pages: 151-154