Pubblicazioni
153 pubblicazioni trovate (pagina 1 di 8)
- Structural Properties and Energy Band Alignment of Crystalline AlN Grown by Atomic Layer Deposition on Epitaxial Graphene
- Atomic layer deposition
- Solid-State Hydrogen Storage in Atomic Layer Deposited α-MoO 3 Thin Films
- Nucleation studies of high-κ aluminum oxide and hafnium oxide thin films on silicon carbide by plasma-enhanced atomic layer deposition
- Solid-state hydrogen storage in atomic layer deposited α−MoO3 thin films
- Towards aluminum oxide/aluminum nitride insulating stacks on 4H–SiC by atomic layer deposition
- Structural and electrical correlation in aluminum nitride thin films grown by plasma enhanced atomic layer deposition as interface insulating layers on silicon carbide (4H-SiC)
- Al2O3 Layers Grown by Atomic Layer Deposition as Gate Insulator in 3C-SiC MOS Devices
- Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2
- Atomic layer deposited α−MoO3 thin films as a promising solid-state hydrogen storage material
- Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
- Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics. Nanomaterials 2023, 13, 976
- Low-temperature atomic layer deposition of TiO2 activated by laser annealing: Applications in photocatalysis
- Early Growth Stages of Aluminum Oxide (Al2O3) Insulating Layers by Thermal- and Plasma-Enhanced Atomic Layer Deposition on AlGaN/GaN Heterostructures
- Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition
- Substrate-Driven Atomic Layer Deposition of High-κ Dielectrics on 2D Materials
- Direct Atomic Layer Deposition of Ultrathin Aluminum Oxide on Monolayer MoS2 Exfoliated on Gold: The Role of the Substrate
- Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $MoS_2$ exfoliated on gold: the role of the substrate
- Direct atomic layer deposition of ultrathin aluminium oxide on monolayer exfoliated on gold: the role of the substrate
- Correlating electron trapping and structural defects in Al2O3 thin films deposited by plasma enhanced atomic layer deposition