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Type: 
Journal
Description: 
Asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers are used to fabricate nanoporous PS templates with different pore diameter depending on the specific substrate neutralization protocol. The resulting polymeric templates are used as masks for the subsequent deposition of a thin (h = 5 nm) amorphous Si layer by electron beam evaporation. After removal of the polymeric film and of the silicon excess, well-defined hexagonally packed amorphous Si nanodots are formed on the substrate. Their average diameter (d 
Publisher: 
Springer Netherlands
Publication date: 
1 Dec 2014
Authors: 

Michele Perego, Andrea Andreozzi, Gabriele Seguini, Sylvie Schamm-Chardon, Celia Castro, Gerard BenAssayag

Biblio References: 
Volume: 16 Issue: 12 Pages: 2775
Origin: 
Journal of nanoparticle research