Praseodymium based dielectric thin films have been deposited by metal-organic chemical vapour deposition (MOCVD). The Weibull slope and the characteristic time of the dielectric breakdown (BD) have been determined at nanometer scale by conductive atomic force microscopy (C-AFM). An anomalous behaviour for the dielectric BD has been found. Its physical behaviour has been described taking into account the electrical properties investigated by nanoscopic measurements performed by scanning capacitance ...
31 May 2007
Volume: 47 Issue: 4 Pages: 640-644