Laser annealing of semiconductor materials is a processing technique offering interesting application features when intense, transient and localized heat sources are needed for electronic device manufacturing or other nano-technological applications. The space-time localization of the induced thermal field (in the nanoseconds/nanometers scale) promotes interesting non-equilibrium phenomena in the processed material which only recently have been systematically investigated and modelled. In this review paper we ...
7 Nov 2016
Materials Science in Semiconductor Processing