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Type: 
Journal
Description: 
Laser annealing of semiconductor materials is a processing technique offering interesting application features when intense, transient and localized heat sources are needed for electronic device manufacturing or other nano-technological applications. The space-time localization of the induced thermal field (in the nanoseconds/nanometers scale) promotes interesting non-equilibrium phenomena in the processed material which only recently have been systematically investigated and modelled. In this review paper we ...
Publisher: 
Pergamon
Publication date: 
7 Nov 2016
Authors: 

SF Lombardo, S Boninelli, F Cristiano, G Fisicaro, G Fortunato, MG Grimaldi, G Impellizzeri, M Italia, A Marino, R Milazzo, E Napolitani, V Privitera, A La Magna

Biblio References: 
Origin: 
Materials Science in Semiconductor Processing