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Type: 
Journal
Description: 
We present a novel additive process, which allows the spatially controlled integration of nanoparticles (NPs) inside silicon surfaces. The NPs are placed between a conductive stamp and a silicon surface; by applying a bias voltage a SiO2 layer grows underneath the stamp protrusions, thus embedding the particles. We report the successful nanoembedding of CoFe2O4 nanoparticles patterned in lines, grids and logic structures.
Publisher: 
Royal Society of Chemistry
Publication date: 
1 Jan 2010
Authors: 

Massimiliano Cavallini, Felice C Simeone, Francesco Borgatti, Cristiano Albonetti, Vittorio Morandi, Claudio Sangregorio, Claudia Innocenti, Francesco Pineider, Emilia Annese, Giancarlo Panaccione, Luca Pasquali

Biblio References: 
Volume: 2 Issue: 10 Pages: 2069-2072
Origin: 
Nanoscale