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Type: 
Journal
Description: 
A process is developed for the fabrication of vertically arranged poly-silicon nanowires via a rigorously top-down batch process. The technique allows the production of wire arrays with larger linear density (projected on the surface) than those achievable with any of the other proposed top-down processes.
Publisher: 
Elsevier
Publication date: 
1 Jun 2011
Authors: 

M Ferri, F Suriano, A Roncaglia, S Solmi, GF Cerofolini, E Romano, D Narducci

Biblio References: 
Volume: 88 Issue: 6 Pages: 877-881
Origin: 
Microelectronic engineering