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Type: 
Journal
Description: 
The photon absorption in Si quantum dots (QDs) embedded in SiO2 has been systematically investigated by varying several parameters of the QD synthesis. Plasma-enhanced chemical vapor deposition (PECVD) or magnetron cosputtering (MS) have been used to deposit, upon quartz substrates, single layer, or multilayer structures of Si-rich-SiO2 (SRO) with different Si content (43–46 at. %). SRO samples have been annealed for 1 h in the 450–1250 °C range and characterized by optical absorption measurements, photoluminescence analysis, Rutherford backscattering spectrometry and x-ray Photoelectron Spectroscopy. After annealing up to 900 °C SRO films grown by MS show a higher absorption coefficient and a lower optical bandgap (∼2.0 eV) in comparison with that of PECVD samples, due to the lower density of Si–Si bonds and to the presence of nitrogen in PECVD materials. By increasing the Si …
Publisher: 
AIP
Publication date: 
15 Nov 2009
Authors: 

S Mirabella, R Agosta, G Franzò, I Crupi, M Miritello, R Lo Savio, MA Di Stefano, S Di Marco, F Simone, A Terrasi

Biblio References: 
Volume: 106 Issue: 10 Pages: 103505
Origin: 
Journal of Applied Physics