Low-temperature (40 K) photoluminescence (PL) measurements were used to follow the defect formation induced in the 4H-SiC epitaxial layer by irradiation with 200 keV H+ and 800 keV C+ in the fluence range of 5×109–3.5×1012 ions/cm2. After irradiation, the PL spectra show the formation of some sharp lines, called “alphabet lines”, located in the wavelength range of 425–443 nm, due to the recombination of excitons at structural defects induced by ion beams. The analysis of luminescence line intensity versus ion fluence allows us to mark two different groups of peaks, namely the P1 group (e, f and g lines) and the P2 group (a, b, c and d lines). The normalised yield of P1 group lines increases with ion fluence and reaches a maximum value, while the normalised yield of P2 group lines exhibits a threshold fluence and then increases until a saturation value is reached. These different trends indicate that, while the …