Papers from the Eighth International Workshop on the Fabrication, Characterization, and Modeling of Ultra-shallow Doping Profiles in Semiconductors-Dopant-Defect Interactions-Fluorine

^-A A ⁺A

Type:

Journal

Description:

Publisher:

Woodbury, NY: Published for the Society by the American Institute of Physics, 1991-

Publication date:

1 Jan 2006

Authors:

Biblio References:

Volume: 24 Issue: 1 Pages: 433-436

Origin:

Journal of Vacuum Science and Technology-Section B

Link:

Scientific Productions