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Type: 
Journal
Description: 
As millisecond annealing is increasingly utilized, the as-implanted profile dominates the final dopant distribution. We characterized boron diffusion in amorphous silicon prior to post-implantation annealing. SIMS confirmed that both fluorine and germanium enhance boron motion in amorphous materials. The magnitude of boron diffusion in germanium amorphized silicon scales with increasing fluorine dose. Boron atoms are mobile at concentrations approaching 1x1019 atoms/cm^3. It appears that defects inherent to the structure of amorphous silicon can trap and immobilize boron atoms at room temperature, but that chemical reactions involving Si-F and Si-Ge eliminate potential trapping sites. Sequential Ge+, F+, and B+ implants result in 80% more boron motion than do sequential Si+, F+, and B+ implants. The mobile boron dose and trapping site concentration change as functions of the fluorine dose through …
Publisher: 
Cambridge University Press
Publication date: 
1 Jan 2006
Authors: 

Jeannette M Jacques, Kevin S Jones, Mark E Law, Lance S Robertson, Leonard M Rubin, Enrico Napolitani

Biblio References: 
Volume: 912
Origin: 
MRS Online Proceedings Library Archive