The self-assembly (SA) of DiBlock Copolymers (DBCs) based on the phase separation into different morphologies of small size and high-density features is widely investigated as patterning and nanofabrication technique. The integration of the conventional top-down approaches with the bottom-up SA of DBCs discloses the possibility to address the gap in nano-structured lateral length standards for nano-metrology, consequently supporting the miniaturization processes in device fabrication. In this frame, we studied the pattern ...