-A A +A

PLASMA EHNANCEMENT OF METALORGANIC CHEMICAL VAPOR DEPOSITION AND PROPERTIES OF ER2 O3 NANOSTRUCTURED THIN FILMS

Type: 
Journal
Description: 
Publisher: 
American Institute of Physics
Publication date: 
1 Jan 2007
Authors: 

G BRUNO, MM GIANGREGORIO, M LOSURDO, A SACCHETTI, P CAPEZZUTO, G MALANDRINO, IL FRAGAL̀, R NIGRO, L ARMELAO, D BARRECA, E TONDELLO

Biblio References: 
Volume: 91 Issue: 6 Pages: 061923
Origin: 
APPLIED PHYSICS LETTERS
Link: 
http://scholar.google.com/scholar?cluster=3343814532944892143&hl=en&oi=scholarr

Scientific Productions