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Type: 
Book
Description: 
Electro optical absorption in hydrogenated amorphous silicon (α-Si:H) – amorphous silicon carbonitride (α-SiCxNy) multilayers have been studied in two different planar multistack waveguides. The waveguides were realized by plasma enhanced chemical vapour deposition (PECVD), a technology compatible with the standard microelectronic processes. Light absorption is induced at λ = 1.55 µm through the application of an electric field which induces free carrier accumulation across the multiple insulator/semiconductor device structure.
Publisher: 
Publication date: 
1 Jan 2009
Authors: 

Sandro Rao, Francesco G Della Corte, FRANCESCO SURIANO, CATERINA SUMMONTE

Biblio References: 
Pages: 385-389
Origin: 
Sensors And Microsystems