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The atomic displacement produced by ion irradiation with 150 keV Ar+ ions has been studied in Ge1Sb2Te4 and Ge2Sb2Te5. Electrical, optical and structural measurements have been employed to characterize the induced electrical and structural modifications. At low temperature the amorphization threshold, evaluated by in situ reflectivity measurements, is independent of the composition and the crystalline structure, and it is equal to 1 × 1013 cm–2. At room temperature, at which dynamic annealing can take place, Ge2Sb2Te5 and Ge1Sb2Te4 in the rocksalt phase exhibit the same amorphization threshold (3 × 1013 cm–2). In the trigonal structure, instead, a higher fluence is required to amorphize the Ge1Sb2Te4, compared to Ge2Sb2Te5. The observed differences between the two compositions can be explained considering the effect of dynamic annealing during ion irradiation of the trigonal phase, which is …
American Scientific Publishers
Publication date: 
1 Jul 2017

S Privitera, AM Mio, W Zhang, R Mazzarello, C Persch, M Wuttig, E Rimini

Biblio References: 
Volume: 9 Issue: 7 Pages: 1095-1101
Nanoscience and Nanotechnology Letters