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Nanostructured materials represent a breakthrough in many fields of application. For sensing, the use of structures with high surface/volume ratio is crucial to obtain a good sensitivity. Chemical growth approaches are preferred to reach this goal but thick micrometers layers are usually needed. To reduce the layer thickness, methods are required to guaranteelarge exposed surfaces in a small volume. We have indeed designed new spongy TiO2 layers by a reactive sputtering method based on a grazing-incidence source combined with the local oxidation of the sputtered species (gig-lox). The process has been implemented with a doping procedure during growth consisting of adding in the reactive environment nitrogen at low flow rate in close proximity of the growing front. We have characterized the layers in terms of porosity, roughness and electrical behaviour with respect an undoped films. The doping procedure …
Publication date: 
1 Aug 2019

Emanuele Smecca, Salvatore Sanzaro, David Grosso, Thomas Bottein, Giovanni Mannino, Guglielmo Guido Condorelli, Antonino La Magna, Alessandra Alberti

Biblio References: 
Volume: 98 Pages: 44-48
Materials Science in Semiconductor Processing