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Type: 
Journal
Description: 
Media characterization has a paramount importance in a broad range of applications including for instance buildings, chemical and mechanical industries and electronic components production. The characterization techniques depend obviously on the specific materials properties we are interested in, ie physical, chemical, mechanical or optical. In particular, in the field of optical characterization the most important and common approach is the spectroscopic one, whereby it is possible to analyze several properties of materials that absorb or reflect electromagnetic radiations in a wide spectral range, from NIR to UV bands. Ellipsometry is the main spectroscopic technique for media optical characterization, and its theoretical fundamentals are in depth described in several books [1]–[4]. It is based on the measurement of the polarization properties of the light beam reflected off the material surface. In this way several media features of interest, such as surface thickness, refractive index, absorption coefficient and anisotropy, can be analyzed.Classical ellipsometric technique for media optical characterization is used to analyze properties of a broad range of materials, such as amorphous semiconductors [5], different types of thin films [6, 7], and flexible substrates [8]. This technique represents a non-destructive, reproducible, quick and accurate analysis: in fact in few minutes it is possible to analyze sample under test features of interest with a high degree of precision, for example an A order of magnitude for thickness, without modifying its properties repeating the measure in the same conditions of previous measures. Unfortunately, this ap-
Publisher: 
EUROPEAN OPTICAL SOC
Publication date: 
1 Jan 2014
Authors: 

A Buono, M Iodice, I Rendina, F Nunziata, M Migliaccio

Biblio References: 
Volume: 9
Origin: 
JOURNAL OF THE EUROPEAN OPTICAL SOCIETY-RAPID PUBLICATIONS