-A A +A
Type: 
Journal
Description: 
Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiOx with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.
Publisher: 
Royal Society of Chemistry
Publication date: 
1 Jan 2019
Authors: 

Zahra Hemmatian, Denis Gentili, Marianna Barbalinardo, Vittorio Morandi, Luca Ortolani, Giampiero Ruani, Massimiliano Cavallini

Biblio References: 
Volume: 1 Issue: 10 Pages: 3887-3891
Origin: 
Nanoscale Advances