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Ge/SiGe multi quantum well fabrication by using reduced pressure chemical vapor deposition

Type: 
Journal
Description: 
CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ]. メニュー 検索 …
Publisher: 
Japan Society of Applied Physics
Publication date: 
27 Dec 2019
Authors: 

Yuji Yamamoto, Oliver Skibitzki, Schubert Markus Andreas, Mario Scuderi, Felix Reichmann, H Zöllner Marvin, Giovanni Capellini, Bernd Tillack

Biblio References: 
Origin: 
Japanese Journal of Applied Physics
Link: 
https://ci.nii.ac.jp/naid/210000157951/

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