Type:
Journal
Description:
X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer. Copyright© 2012 John Wiley & Sons, Ltd.
Publisher:
Publication date:
1 Aug 2012
Biblio References:
Volume: 44 Issue: 8
Origin:
Surface & Interface Analysis: SIA