The rapid advancement of nanoscience has driven significant interest in manipulating materials at the nanoscale, a capability critical to diverse High-tech fields. Achievements in nanoscale analysis and nanofabrication have facilitated practical applications across a range of fields, including nanoelectronics, nanofluidics, drug delivery, optical and plasmonic devices, and biosensing. Nonetheless, conventional top-down fabrication techniques, such as electron beam lithography, focused ion beam lithography, soft lithography, and nanoimprint lithography, are frequently constrained by factors such as cost, scalability, and manufacturing complexity. Scanning Probe-based Lithography (SPL) has recently emerged as a promising alternative, offering precise nanostructure fabrication and immediate characterization in ambient conditions. This paper focuses on Raster-Atomic Force nanolithography (R-AFL), highlighting its …