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AT CNR IMM Rome Unit are available several laboratories for devices and materials characterization.

 

Electrical Characterization Lab

 

  • Suss PM5HF Analytical Probe System for DC and HF electrical measurements of samples up to 6 inches
  • A second probe station for flexible substrates devices measurements
  • A variable Temperature Micro-Probe System by MMR Technologies for electrical measurements of devices in vacuum in a temperature range of 80-580K
  • Semicondutor Parameter Analyzer HP4145B for Dc electrical characteristics
  • UV PERKIN ELMER Lambda35 Spectrometer
  • FTIR PERKIN ELMER Spectrum 1000
  • Keithley 236 Source measure unit
 
Material Electrical Characterization Lab

 

  • Digital Voltage Source Keithley k230
  • Digital Current Source
  • Quasi-static CV meter
  • CV meter
  • MKS Mass Flow Controller
  • Keithley 6517A Electrometer
  • Keithley 2001 Multimeter
  • Hewlet Packard Multimeter
  • Hewlet Packard Digital Oscilloscope
  • Keithley 199 DMM Scanner
  • Hewlet Packard Dynamic Signal Analyzer
  • EG&G Lock in Amplifier
  • Stanford Research Low Noise Amplifier
  • Stanford Research Synthetized Function Generator
  • Spectra Physics Laser
  • MEMMERT Vertical Furnace
  • Memmert Oven
  • Vacuum Bell for electrical sensors characterization avoiding interfering gases
 
Optoelectronic Lab

 

  • Optical microscope (50x - 500x) with long working distance objective, digital photo and video cameras; the microscopes operates in transmission, reflection, polarized light, bright and dark and interference field (Nomarski technique) and conoscopy (Bertrand lens)
  • Calibrated graded retardation plates (Berek) for measurements of optical retardation (Leica)
  • Optical bench
  • Hot stage (up to 250 °C) for microscope and bench use
  • Fiber optics spectrophotometer for UV-VIS light, soon to be expanded to IR (<900 nm), for microscope and bench use
  • Computer controlled precision translation and rotating stage setup
  • Manually controlled translation and rotation stage system
  • Solid state and He-Ne lasers
  • Incoherent visible and UV light sources
  • 500 Mhz, 4 channel, long memory digital sampling oscilloscope (LeCroy Waverunner 6050)
 
Millimetre and Microwave Design and Test Lab

 

  • Autodesk AutoCAD for mask design
  • Agilent ADS and AWR - Microwave Office for circuit simulations
  • Comsol Multiphysics for electro-mechanics and electromagnetic simulations
  • FORTRAN, MATHCAD and MATLAB for general purpose computations and graphics
  • Agilent VEE for instrumentations remote control
  • Ferromagnetic Resonance (FMR) waveguide equipment (magnetic materials line-width measurements at 9.25 GHz in a TE102 cavity)
  • HP Spectrum Analyzer up to 22 GHz , for spectral measurements (phase noise, non-linear effects, …)
  • HP8510C Vector Network Analyzer for S-parameter measurement up to 18 GHz
 
On wafer Millimeter and Microwave Test Lab

 

On wafer Millimeter and Microwave Test Lab is dedicated to RF parameter measurement on environment condition sensitive devices. For this reason the entire lab is located in a special bay inside the clean-room facility.
  • Probe Station for on wafer measurements up to 50 GHz A Karl Süss MP5 Probe Station equipped with Picoprobe / Karl Süss G-S-G high frequency probes and DC probes for testing coplanar structures up to 50 GHz is connected to a HP8510C Vector Network Analyzer, operation range frequency is from 45 MHz up to 50 GHz. Wafers from 1" up to to 4" can be mounted on a vacuum porous chuk. A nitrogen flux system is also available for lower the residual humidity down to 30% ca. in the test area. For the best tips and contacts positioning the probe station Olympus microscope is equipped with a high resolution video camera and a computer link-up allows a quick measurements elaborations
  • HP8510C Vector Network Analyzer Analyzer for S-parameter measurement up to 50 GHz Microwave and millimetre wave characterizations of active and passive devices from 45 MHz to 50 GHz. The instrument can be remotely controlled via GPIB interface for automated measurement
  • HP oscilloscope Digital oscilloscope for microwave and optical devices characterization up to 20 GHz
  • Anechoic Chamber for millimetre wave antenna measurements (33-50 GHz). Covered inside by absorbing material to avoid EMI problems
  • BIEMME T250 Thermostatic Chamber with a link to the Vector analyzer to perform S parameter measurements versus temperature from -40 C to 170 C. It can be used for the temperature response and aging of packaged devices
 
Millimetre and Microwave Materials and Process Lab

 

  • Two vertical furnaces for LPE of magnetic films, temperature controlled and with automatic dipping and movements of the substrates
  • Horizontal furnace for materials thermal annealing
  • Logitech machine for materials lapping and optical polishing
  • Kulicke & Soffa precision dicing machine (mechanical movement precision close to 1 µm) with 4" porous chuk, for allumina, silicon and garnet films cutting
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