Semiconductor Devices, Materials, and Processing-Quantitative Measurements of Two-Dimensional Ultrashallow B Profiles in Si by Selective Chemical Etching

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Type:

Journal

Description:

Publisher:

New York, NY: Electrochemical Society, 1948-

Publication date:

1 Jan 2005

Authors:

S Scalese, A La Magna, M Italia, S Pannitteri, V Privitera, R Duffy, MJP Hopstaken

Biblio References:

Volume: 152 Issue: 4 Pages: G277

Origin:

Journal of the Electrochemical Society

Link:

Scientific Productions