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Type: 
Journal
Description: 
Silicon wafers were preamorphized with 60 keV Ge+ or 70 keV Si+ at a dose of 1×1015 atoms∕cm2. F+ was then implanted into some samples at 6 keV at doses ranging from 1×1014 to 5×1015 atoms∕cm2, followed by B+11 implants at 500 eV, 1×1015atoms∕cm2. Secondary-ion-mass spectrometry confirmed that fluorine enhances boron motion in germanium-preamorphized materials in the absence of annealing. The magnitude of boron diffusion scales with increasing fluorine dose. Boron motion in as-implanted samples occurs when fluorine is concentrated above 1×1020atoms∕cm3. Boron atoms are mobile in as-implanted, amorphous material at concentrations up to 1×1019atoms∕cm3. Fluorine directly influences boron motion only prior to activation annealing. During the solid-phase epitaxial regrowth process, fluorine does not directly influence boron motion, it simply alters the recrystallization rate of the …
Publisher: 
AIP
Publication date: 
1 Oct 2005
Authors: 

JM Jacques, KS Jones, LS Robertson, A Li-Fatou, CM Hazelton, E Napolitani, LM Rubin

Biblio References: 
Volume: 98 Issue: 7 Pages: 073521
Origin: 
Journal of applied physics