Authors: 

Manuela Melucci, Ana Borrachero, Emanuele Treossi, Alessandra Scida, Emanuela Saracino, Meganne Christian, Vittorio Morandi, Giulia Tuci, Giuliano Giambastiani, L Ottaviano, Francesco Perrozzi, Valentina Benfenati, Vincenzo Palermo

Authors: 

TOBA SAMUEL Anjorin, Pius Ikokoh, Simon Okolo

Authors: 

Bahram Azizollah Ganji, Sedighe Babaei Sedaghat, Alberto Roncaglia, Luca Belsito

The laboratory is dedicated to perform the measurements necessary for verification of process steps and to evaluate the electrical performances on test structures and devices at wafer level. Both manual and automatic systems are available.

 

The Laboratory is an ISO 5 clean room that includes facilities for Photolithography processes.

The laboratory includes facilities dedicated to deposition and growth on wafer substrates of several materials such as semiconductors (TiO2, ZnO, Si, Ge, Al2O3), metals (Ti, Ni, Pd, Pt Tu, Ag, Au, Al), and different carbon allotropes as  CNT, Graphene layers, by u

Authors: 

Diego Gonzalez, Mariano Celada, Merced Montesinos

Authors: 

Hussein M Ayedh, Maurizio Puzzanghera, Bengt Gunnar Svensson, Roberta Nipoti

Authors: 

Diego Marini, Marco Iuliano, Filippo Bastianini, Gabriele Bolognini

Authors: 

Ferroni Matteo, Alberto Signoroni, Andrea Sanzogni, Andrea Migliori, Luca Ortolani, Vittorio Morandi

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