The laboratory is dedicated to perform the measurements necessary for verification of process steps and to evaluate the electrical performances on test structures and devices at wafer level. Both manual and automatic systems are available.

 

The Laboratory is an ISO 5 clean room that includes facilities for Photolithography processes.

The laboratory includes facilities dedicated to deposition and growth on wafer substrates of several materials such as semiconductors (TiO2, ZnO, Si, Ge, Al2O3), metals (Ti, Ni, Pd, Pt Tu, Ag, Au, Al), and different carbon allotropes as  CNT, Graphene layers, by u

Authors: 

Diego Gonzalez, Mariano Celada, Merced Montesinos

Authors: 

Hussein M Ayedh, Maurizio Puzzanghera, Bengt Gunnar Svensson, Roberta Nipoti

Authors: 

Diego Marini, Marco Iuliano, Filippo Bastianini, Gabriele Bolognini

Authors: 

Ferroni Matteo, Alberto Signoroni, Andrea Sanzogni, Andrea Migliori, Luca Ortolani, Vittorio Morandi

Authors: 

Andrea Parisini, Stefano Frabboni, Gian Carlo Gazzadi, Aldo Armigliato, Rodolfo Rosa

Authors: 

Roberta Nipoti, Maurizio Puzzanghera, Mariaconcetta Canino, Giovanna Sozzi, Paolo Fedeli

Authors: 

Roberta Nipoti, Maurizio Puzzanghera, Giovanna Sozzi, Roberto Menozzi

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