Type:
Journal
Description:
Cerium dioxide (CeO2) thin films were deposited by atomic layer deposition (ALD) on both Si and TiN substrates. The ALD growth produces CeO2 cubic polycrystalline films on both substrates. However, the films show a preferential orientation along crystallographic direction for CeO2/Si or
Publisher:
Springer International Publishing
Publication date:
1 Oct 2017
Biblio References:
Volume: 2 Issue: 52 Pages: 3005-3010
Origin:
MRS Advances