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Phosphorous and Aluminum Implantation for MOSFET Manufacturing: Revisiting Implantation Dose Rate and Subsequent Surface Morphology

Judith Woerle, Manuel Belanche, Marco Negri, Christopher Lamontagne, Filippo Bonafe, Roberta Nipoti, Ulrike Grossner

2022-01-01

Biblio references: Volume: 1062 Pages: 263-267

Origin: Materials Science Forum

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