High-k polycrystalline Pr2O3 and amorphous LaAlO3 oxide thin films deposited on Si(0 0 1) are studied. The microstructure is investigated using X-ray diffraction and scanning electron microscopy. Optical properties are determined in the 0.75–6.5 eV photon energy range using spectroscopic ellipsometry. The polycrystalline Pr2O3 films have an optical gap of 3.86 eV and a dielectric constant of 16–26, which increases with film thickness. Similarly, very thin amorphous LaAlO3 films have the optical gap of 5.8 eV, and a dielectric constant below 14 which also increases with film thickness. The lower dielectric constant compared to crystalline material is an intrinsic characteristic of amorphous films.
31 Oct 2006
Volume: 253 Issue: 1 Pages: 322-327
Applied surface science