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Type: 
Conference
Description: 
A process has been developed to grow multi-epy high doped structure. Trichlorosilane (TCS) and Ethylene have been used as precursor; Nitrogen (N2) and trimethylaluminum (TMA) as doping source. The SIMS and SCM analysis show that using this silicon precursor very abrupt N++/P+/N+ junctions (40-60 nm) can be obtained with low background doping concentration in a single epitaxial growth run.
Publisher: 
Trans Tech Publications Ltd
Publication date: 
1 Jan 2009
Authors: 

Giuseppe Condorelli, Marco Mauceri, Giuseppe Pistone, LMS Perdicaro, Giuseppe Abbondanza, F Portuese, Gian Luca Valente, Danilo Crippa, Filippo Giannazzo, Francesco La Via

Biblio References: 
Volume: 600 Pages: 127-130
Origin: 
Materials Science Forum