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New Multi-technique Surface Characterization Equipment installed at CNR-IMM headquarters in Catania.


A fully automated PHI Genesis multi-technique XPS/HAXPES system has recently been installed at IMM headquarters in Catania, within the “Materials and processes Beyond the Nano–scale (Beyond–Nano)" Project. In order to meet today’s advanced materials surface characterization needs, it has been customized with several characterization techniques in addition to X-ray Photoelectron Spectroscopy (XPS): Auger Electron Spectroscopy (AES), Reflection Electron Energy Loss Spectroscopy (REELS), Low-Energy Inverse Photoemission Spectroscopy (LEIPS), Ultra-Violet Photoelectron Spectroscopy (UPS). Therefore, through an array of excitation sources, sputter ion sources, sample treatment and transfer capabilities, the system can cover the full range of energy: from measuring the conduction band onset to core-level excitation, all within the same area of the sample. The capabilities of the tool have been further enhanced by the integration of an external Prevac preparation chamber, coupled with a LEED-Auger spectrometer and a motorised manipulator.  


Main features

  • Easy operation & multi-technique options (AES, REELS, LEIPS, UPS, LEED)
  • Fully automated with sample parking
  • High-performance large & micro area XPS analysis
  • High speed & nondestructive depth profiling
  • Hard X-ray Cr Kα source for HAXPES
  • Accurate sample temperature control in the range -100°C<T<500°C (Gemini system) and -120°C<T<600°C (Prevac System)


- Contact person: Dr. Silvia Scalese -


Links to Equipment Suppliers: 

PHI Genesis (XPS) Surface Analysis Instrument

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