Valerio Striano3 and Giuseppe Coppola1* Address all correspondence to: antonella. ferrara@ na. imm. cnr. it 1 National Research Council, Institute for Microelectronics and …

Authors: 

Maria Antonietta Ferrara, Gaetano Bianco, Fabio Borbone, Roberto Centore

Performances of a CPC Collector inside a High Vacuum Flat Panel

Authors: 

Roberto Russo, Francesco Di Giamberardino, Matteo Monti, Carmine D’Alessandro, Davide De Maio, Marilena Musto, Vittorio G Palmieri

Nitrogen doped spongy TiO2 layers for sensors application

Authors: 

Emanuele Smecca, Salvatore Sanzaro, David Grosso, Thomas Bottein, Giovanni Mannino, Guglielmo Guido Condorelli, Antonino La Magna, Alessandra Alberti

Flexible Conductors from Brown Algae for Green Electronics

Authors: 

Piera Maccagnani, Monica Bertoldo, Franco Dinelli, Mauro Murgia, Caterina Summonte, Luca Ortolani, Giulio Pizzochero, Roberto Verucchi, Cristian Collini, Raffaella Capelli

Characterization of Si Nanocrystals Embedded in SiO2 Matrix by Atom Probe Tomography

Authors: 

B Han, Yasuo Shimizu, Gabriele Seguini, Elisa Arduca, Celia Castro, Gérard Benassayag, Koji Inoue, Yasuyochi Nagai, Sylvie Schamm-Chardon, Michele Perego

Probing the uniformity of hydrogen intercalation in quasi-free-standing epitaxial graphene on SiC by micro-Raman mapping and conductive atomic force microscopy.

Authors: 

F Giannazzo, Ivan Shtepliuk, Ivan Gueorguiev Ivanov, Tihomir Iakimov, A Kakanakova-Georgieva, E Schilirò, P Fiorenza, Rositsa Yakimova

Si and Sn doping of ε-Ga2O3 layers

Authors: 

A Parisini, A Bosio, V Montedoro, A Gorreri, A Lamperti, M Bosi, G Garulli, S Vantaggio, R Fornari

High-Performance Electrofluorochromic Switching Devices Using a Novel Arylamine-Fluorene Redox-Active Fluorophore

Authors: 

Giuseppina A Corrente, Eduardo Fabiano, Massimo La Deda, Francesca Manni, Giuseppe Gigli, Giuseppe Chidichimo, Agostina-L Capodilupo, Amerigo Beneduci

Unravelling the Charge State of Oxygen Vacancies in ZrO2-x on the Basis of Synergistic Computational and Experimental Evidence

Authors: 

Claudio Imparato, Marzia Fantauzzi, Cristiana Passiu, Ilaria Rea, Chiara Ricca, Ulrich Aschauer, Filomena Sannino, Gerardino D'Errico, Luca De Stefano, Antonella Rossi, Antonio Aronne

DSA Symposium 2019

Date: 
2019-10-16 to 2019-10-18

The 5th edition of the international DSA symposium will be organized in Milan, Oct. 14-18, 2019. Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application.

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