The 5th edition of the international DSA symposium will be organized in Milan, Oct. 14-18, 2019. Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application.
A Mokhles Gerami, I Unzueta, HP Gunnlaugsson, PB Krastev, D Naidoo, YA Matveyev, K Nomura, G Langouche, H Masenda, M Ncube, K Johnston, S Shayestehaminzadeh, HP Gislason, TE Mølholt, S ́Olafsson, R Mantovan