Authors: 

Giuseppina A Corrente, Eduardo Fabiano, Massimo La Deda, Francesca Manni, Giuseppe Gigli, Giuseppe Chidichimo, Agostina-L Capodilupo, Amerigo Beneduci

Authors: 

Claudio Imparato, Marzia Fantauzzi, Cristiana Passiu, Ilaria Rea, Chiara Ricca, Ulrich Aschauer, Filomena Sannino, Gerardino D'Errico, Luca De Stefano, Antonella Rossi, Antonio Aronne

Date: 
2019-10-16 to 2019-10-18

The 5th edition of the international DSA symposium will be organized in Milan, Oct. 14-18, 2019Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application.

Authors: 

Annalisa De Angelis, Maria Antonietta Ferrara, Gianfranco Coppola, Loredana Di Matteo, Laura Siani, Brian Dale, Giuseppe Coppola, Anna Chiara De Luca

Authors: 

Rachela Gabriella Milazzo, Stefania MS Privitera, Silvia Scalese, Francesca Monforte, Guglielmo Guido Condorelli, Salvatore Lombardo

Authors: 

Chiara Schiattarella, Monica Terracciano, Thomas Defforge, Gaël Gautier, Bartolomeo Della Ventura, Rosalba Moretta, Luca De Stefano, Raffaele Velotta, Ilaria Rea

Authors: 

G Rappazzo, C Avanzato, GP Petronio, M Clausi, E Tarasco, MA Buccheri, PM Furneri, MC Scuderi, MT Vinciguerra

Authors: 

Guiju Liu, Raffaello Mazzaro, Yiqian Wang, Haiguang Zhao, Alberto Vomiero

Authors: 

A Mokhles Gerami, I Unzueta, HP Gunnlaugsson, PB Krastev, D Naidoo, YA Matveyev, K Nomura, G Langouche, H Masenda, M Ncube, K Johnston, S Shayestehaminzadeh, HP Gislason, TE Mølholt, S ́Olafsson, R Mantovan

Authors: 

Luca De Stefano, Ilaria Rea, Alessandro Caliò, Jane Politi, Monica Terracciano, Ghenadii Korotcenkov

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