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Ordered magnetic nanodot arrays with extremely high density provide unique properties to the growing field of nanotechnology. To overcome the size limitations of conventional lithography, a fine-tuned sputtering deposition process on mesoporous polymeric template fabricated by diblock copolymer self-assembly is herein proposed to fabricate uniform and densely spaced nanometer-scale magnetic dot arrays. This process was successfully exploited to pattern, over a large area, sputtered Ni80Fe20 and Co thin films with thicknesses of 10 and 13 nm, respectively. Carefully tuned sputter-etching at a suitable glancing angle was performed to selectively remove the magnetic material deposited on top of the polymeric template, producing nanodot arrays (dot diameter about 17 nm). A detailed study of magnetization reversal at room temperature as a function of sputter-etching time, together with morphology …
Royal Society of Chemistry
Publication date: 
1 Jan 2017

Gabriele Barrera, F Celegato, M Coïsson, A Manzin, F Ferrarese Lupi, G Seguini, L Boarino, G Aprile, M Perego, P Tiberto

Biblio References: 
Volume: 9 Issue: 43 Pages: 16981-16992