In this work, we present a simple method, based on a modified thermal evaporation technique, to obtain films of nanostructured WO3 with high surface roughness. This method consists on sublimation from a metallic tungsten wire followed by oxidation in low vacuum conditions and reactive atmosphere (pO2= 0.22 mbar), with substrates heated at high temperature (600° C). Electron microscopy (SEM, TEM) and atomic force microscopy (AFM) analysis revealed that the deposited films are composed of agglomerates with nanometric ...
21 Oct 2005
Volume: 490 Issue: 1 Pages: 81-85
Thin Solid Films