2008 | IMM Container

Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

A Lamperti, S Spiga, HL Lu, C Wiemer, M Perego, E Cianci, M Alia, M Fanciulli

2008-12-01

Biblio references: Volume: 85 Issue: 12 Pages: 2425-2429

Origin: Microelectronic Engineering

New selector based on zinc oxide grown by low temperature atomic layer deposition for vertically stacked non-volatile memory devices

N Huby, G Tallarida, M Kutrzeba, S Ferrari, E Guziewicz, M Godlewski

2008-12-01

Biblio references: Volume: 85 Issue: 12 Pages: 2442-2444

Origin: Microelectronic Engineering

Vertically stacked non-volatile memory devices–material considerations

M Godlewski, E Guziewicz, J Szade, A Wójcik-Głodowska, T Krajewski, K Kopalko, R Jakieła, S Yatsunenko, E Przeździecka, P Kruszewski, N Huby, G Tallarida, S Ferrari

2008-12-01

Biblio references: Volume: 85 Issue: 12 Pages: 2434-2438

Origin: Microelectronic Engineering

Integration of organic based Schottky junctions into crossbar arrays by standard UV lithography

E Katsia, G Tallarida, B Kutrzeba-Kotowska, S Ferrari, E Bundgaard, R Sondergaard, FC Krebs

2008-12-01

Biblio references: Volume: 9 Issue: 6 Pages: 1044-1050

Origin: ORGANIC ELECTRONICS

Dispersion and damping of gold surface plasmon

A Politano, V Formoso, G Chiarello

2008-12-01

Biblio references: Volume: 3 Issue: 4 Pages: 165

Origin: Plasmonics

Solutions of negatively charged graphene sheets and ribbons

Cristina Vallés, Carlos Drummond, Hassan Saadaoui, Clascidia A Furtado, Maoshuai He, Olivier Roubeau, Luca Ortolani, Marc Monthioux, Alain Pénicaud

2008-11-26

Biblio references: Volume: 130 Issue: 47 Pages: 15802-15804

Origin: Journal of the american chemical society

A microstructure study of nanostructured Fe–Mo+ 1.5 wt.% SiO 2 and+ 1.5 wt.% TiO 2 powders compacted by spark plasma sintering

M Cabibbo, C Paternoster, R Cecchini, A Fabrizi, A Molinari, S Libardi, M Zadra

2008-11-25

Biblio references: Volume: 496 Issue: 1-2 Pages: 121-132

Origin: Materials Science and Engineering: A

Shaping of silicon crystals for channelling experiments through anisotropic chemical etching

Stefano Baricordi, Vincenzo Guidi, Andrea Mazzolari, Donato Vincenzi, M Ferroni

2008-11-25

Biblio references: Volume: 41 Issue: 24 Pages: 245501

Origin: Journal of Physics D: Applied Physics

Effect of shape and surface chemistry of TiO 2 colloidal nanocrystals on the organic vapor absorption capacity of TiO 2/PMMA composite

Annalisa Convertino, Gabriella Leo, Marinella Striccoli, Gaetano Di Marco, M Lucia Curri

2008-11-24

Biblio references: Volume: 49 Issue: 25 Pages: 5526-5532

Origin: Polymer

Mechanisms leading to alkali oxidation on metal surfaces

A Politano, V Formoso, G Chiarello

2008-11-20

Biblio references: Volume: 112 Issue: 46 Pages: 17772-17774

Origin: The Journal of Physical Chemistry C

Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

New selector based on zinc oxide grown by low temperature atomic layer deposition for vertically stacked non-volatile memory devices

Vertically stacked non-volatile memory devices–material considerations

Integration of organic based Schottky junctions into crossbar arrays by standard UV lithography

Dispersion and damping of gold surface plasmon

Solutions of negatively charged graphene sheets and ribbons

A microstructure study of nanostructured Fe–Mo+ 1.5 wt.% SiO 2 and+ 1.5 wt.% TiO 2 powders compacted by spark plasma sintering

Shaping of silicon crystals for channelling experiments through anisotropic chemical etching

Effect of shape and surface chemistry of TiO 2 colloidal nanocrystals on the organic vapor absorption capacity of TiO 2/PMMA composite

Mechanisms leading to alkali oxidation on metal surfaces

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Units in Italy

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