-A A +A
Surname: 
Wiemer
Firstname: 
Claudia
Position: 
Staff
Profile: 
Researcher
Phone: 
039/6032885
Activity: 

Structural and morphological analysis of thin films for microelectronic application by X-ray diffraction, X-ray reflectivity, Total reflection X-ray fluorescence. Study of atomic layer deposition phenomena for the deposition of oxydes. Study of chalcogenide compounds

claudia.wiemer@mdm.imm.cnr.it

Curriculum (PDF): 
Source: 

Scientific Productions

Raimondo Cecchini, Raja SR Gajjela, Christian Martella, Claudia Wiemer, Alessio Lamperti, Lucia Nasi, Laura Lazzarini, Luca G Nobili, Massimo Longo

High‐Density Sb2Te3 Nanopillars Arrays by Templated, Bottom‐Up MOCVD Growth

Small [], Pages: 1901743

E Longo, C Wiemer, R Cecchini, M Longo, A Lamperti, A Khanas, A Zenkevich, M Fanciulli, R Mantovan

Chemical, structural and magnetic properties of the Fe/Sb2Te3 interface

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 474 Pages: 632-636

R Cecchini, S Selmo, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

In-doped Sb nanowires grown by MOCVD for high speed phase change memories.

Micro and Nano Engineering [Elsevier], Volume: 2 Pages: 117-121

E Longo, C Wiemer, R Cecchini, M Longo, A Lamperti, A Khanas, A Zenkevich, M Fanciulli, R Mantovan

Chemical, structural and magnetic properties of the Fe/Sb2Te3 interface

Journal of Magnetism and Magnetic Materials [North-Holland],

R Cecchini, S Selmo, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

In-doped Sb nanowires grown by MOCVD for high speed phase change memories

Micro and Nano Engineering [Elsevier], Volume: 2 Pages: 117-121

E Cianci, A Lamperti, G Tallarida, M Zanuccoli, C Fiegna, L Lamagna, S Losa, S Rossini, F Vercesi, D Gatti, C Wiemer

Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications

Sensors and Actuators A: Physical [Elsevier], Volume: 282 Pages: 124-131

Sabina Spiga, Francesco Driussi, Gabriele Congedo, Claudia Wiemer, Alessio Lamperti, Elena Cianci

Sub-1-nm equivalent oxide thickness Al-HfO2 trapping layer with excellent thermal stability and retention for non-volatile memory

ACS Applied Nano Materials [American Chemical Society], Volume: 1 Issue: 9 Pages: 4633-4641

Raimondo Cecchini, Simone Selmo, Claudia Wiemer, Enzo Rotunno, Laura Lazzarini, Marta De Luca, Ilaria Zardo, Massimo Longo

Single-step Au-catalysed synthesis and microstructural characterization of core–shell Ge/In–Te nanowires by MOCVD

Materials Research Letters [Taylor & Francis], Volume: 6 Issue: 1 Pages: 29-35

Raimondo Cecchini, Roberto Mantovan, Claudia Wiemer, Lucia Nasi, Laura Lazzarini, Massimo Longo

Weak Antilocalization in Granular Sb2Te3 Thin Films Deposited by MOCVD

physica status solidi (RRL)–Rapid Research Letters [WILEY? VCH Verlag Berlin GmbH], Pages: 1800155

Raimondo Cecchini, Roberto Mantovan, Claudia Wiemer, Lucia Nasi, Laura Lazzarini, Massimo Longo

Weak Antilocalization in Granular Sb2Te3 Thin Films Deposited by MOCVD

physica status solidi (RRL)–Rapid Research Letters [WILEY? VCH Verlag Berlin GmbH], Pages: 1800155

R Mantovan, R Fallica, A Mokhles Gerami, TE Mølholt, C Wiemer, M Longo, HP Gunnlaugsson, K Johnston, H Masenda, D Naidoo, M Ncube, K Bharuth-Ram, M Fanciulli, Hafliði Pétur Gislason, Guido Langouche, Sveinn Olafsson, G Weyer

Atomic-scale study of the amorphous-to-crystalline phase transition mechanism in GeTe thin films.

Scientific reports [Nature Publishing Group], Volume: 7 Issue: 1 Pages: 8234

Raimondo Cecchini, Simone Selmo, Claudia Wiemer, Enzo Rotunno, Laura Lazzarini, Marta De Luca, Ilaria Zardo, Massimo Longo

Single-step Au-catalysed synthesis and microstructural characterization of core–shell Ge/In–Te nanowires by MOCVD

Materials Research Letters [Taylor & Francis], Volume: 6 Issue: 1 Pages: 29-35

S Selmo, R Cecchini, S Cecchi, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Rigato, D Pogany, A Lugstein, M Longo

Low power phase change memory switching of ultra-thin In3Sb1Te2 nanowires

Applied Physics Letters [AIP Publishing], Volume: 109 Issue: 21 Pages: 213103

Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [AVS], Volume: 34 Issue: 5 Pages: 051510

J‐L Battaglia, A Kusiak, C Gaborieau, Y Anguy, HT Nguyen, C Wiemer, R Fallica, D Campi, M Bernasconi, M Longo

Evolution of thermal conductivity of In3Sbβ Teγ thin films up to 550° C

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag Berlin GmbH], Volume: 10 Issue: 7 Pages: 544-548

Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

Applied Surface Science [North-Holland], Volume: 368 Pages: 470-476

S Vangelista, A Lamperti, C Wiemer, M Fanciulli, R Mantovan

Atomic Layer Deposition of hexagonal ErFeO 3 thin films on SiO 2/Si

Thin Solid Films [Elsevier], Volume: 604 Pages: 18-22

S Selmo, S Cecchi, R Cecchini, C Wiemer, M Fanciulli, E Rotunno, L Lazzarini, M Longo

MOCVD growth and structural characterization of In–Sb–Te nanowires

physica status solidi (a) [], Volume: 213 Issue: 2 Pages: 335-338

Enzo Rotunno, Massimo Longo, Claudia Wiemer, Roberto Fallica, Davide Campi, Marco Bernasconi, Andrew R Lupini, Stephen J Pennycook, Laura Lazzarini

A Novel Sb2Te3 Polymorph Stable at the Nanoscale

Chemistry of Materials [American Chemical Society], Volume: 27 Issue: 12 Pages: 4368-4373

G Seguini, J Llamoja Curi, S Spiga, G Tallarida, C Wiemer, M Perego

Solid-state dewetting of ultra-thin Au films on SiO2 and HfO2

Nanotechnology [IOP Publishing], Volume: 25 Issue: 49 Pages: 495603

Jean-Luc Battaglia, Andrzej Kusiak, Abdelhak Saci, Roberto Fallica, Alessio Lamperti, Claudia Wiemer

Effect of a thin Ti interfacial layer on the thermal resistance of Ge2Sb2Te5-TiN stack

Applied Physics Letters [AIP Publishing], Volume: 105 Issue: 12 Pages: 121903

Alessio Lamperti, Alessandro Molle, Elena Cianci, Claudia Wiemer, S Spiga, M Fanciulli

Effect on Al: MO2/In0. 53Ga0. 47As interface (M= Hf, Zr) of trimethyl-aluminum pre-treatment during atomic layer deposition

Thin Solid Films [Elsevier], Volume: 563 Pages: 44-49

Alessio Lamperti, Alessandro Molle, Elena Cianci, Claudia Wiemer, S Spiga, M Fanciulli

Effect on Al: MO 2/In 0.53 Ga 0.47 As interface (M= Hf, Zr) of trimethyl-aluminum pre-treatment during atomic layer deposition

Thin Solid Films [Elsevier], Volume: 563 Pages: 44-49

Roberto Fallica, Claudia Wiemer, Toni Stoycheva, Elena Cianci, Massimo Longo, Huu Tan Nguyen, Andrzej Kusiak, Jean-Luc Battaglia

Thermal properties of In–Sb–Te films and interfaces for phase change memory devices

Microelectronic Engineering [Elsevier], Volume: 120 Pages: 3-8

R Mantovan, S Vangelista, C Wiemer, A Lamperti, G Tallarida, E Chikoidze, Y Dumont, M Fanciulli

Synthesis of multiferroic Er-Fe-O thin films by atomic layer and chemical vapor deposition

Journal of Applied Physics [AIP], Volume: 115 Issue: 17 Pages: 17D907

Elena Cianci, Alessandro Molle, Alessio Lamperti, Claudia Wiemer, Sabina Spiga, Marco Fanciulli

Phase Stabilization of Al: HfO2 Grown on In x Ga1–x As Substrates (x= 0, 0.15, 0.53) via Trimethylaluminum-Based Atomic Layer Deposition

ACS applied materials & interfaces [American Chemical Society], Volume: 6 Issue: 5 Pages: 3455-3461

Roberto Fallica, Enrico Varesi, Luca Fumagalli, Simona Spadoni, Massimo Longo, Claudia Wiemer

Effect of nitrogen doping on the thermal conductivity of GeTe thin films

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag], Volume: 7 Issue: 12 Pages: 1107-1111

Andrea Cappella, Jean‐Luc Battaglia, Vincent Schick, Andrzej Kusiak, Alessio Lamperti, Claudia Wiemer, Bruno Hay

High temperature thermal conductivity of amorphous Al2O3 thin films grown by low temperature ALD

Advanced Engineering Materials [], Volume: 15 Issue: 11 Pages: 1046-1050

Roberto Fallica, Toni Stoycheva, Claudia Wiemer, Massimo Longo

Structural and electrical analysis of In–Sb–Te‐based PCM cells

physica status solidi (RRL)–Rapid Research Letters [WILEY‐VCH Verlag], Volume: 7 Issue: 11 Pages: 1009-1013

Andrea Cappella, Jean‐Luc Battaglia, Vincent Schick, Andrzej Kusiak, Alessio Lamperti, Claudia Wiemer, Bruno Hay

High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD

Advanced Engineering Materials [], Volume: 15 Issue: 11 Pages: 1046-1050

Jean-Luc Battaglia, Vincent Schick, Clément Rossignol, Andrzej Kusiak, Isabelle Aubert, Alessio Lamperti, Claudia Wiemer

Thermal resistance at Al-Ge2Sb2Te5 interface

Applied Physics Letters [AIP], Volume: 102 Issue: 18 Pages: 181907

M Longo, T Stoycheva, R Fallica, C Wiemer, L Lazzarini, E Rotunno

Au-catalyzed synthesis and characterisation of phase change Ge-doped Sb–Te nanowires by MOCVD

Journal of Crystal Growth [North-Holland], Volume: 370 Pages: 323-327

T Stoycheva, M Longo, R Fallica, F Volpe, C Wiemer

Growth study and characterization of In–Sb–Te compounds deposited onto different substrates by metal–organic chemical vapour deposition

Thin Solid Films [Elsevier], Volume: 533 Pages: 66-69

Gabriele Congedo, Claudia Wiemer, Alessio Lamperti, Elena Cianci, Alessandro Molle, Flavio G Volpe, Sabina Spiga

Atomic layer-deposited Al–HfO 2/SiO 2 bi-layers towards 3D charge trapping non-volatile memory

Thin Solid Films [Elsevier], Volume: 533 Pages: 9-14

G Seguini, E Cianci, C Wiemer, D Saynova, JAM Van Roosmalen, M Perego

Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

Applied Physics Letters [AIP], Volume: 102 Issue: 13 Pages: 131603

Alessandro Molle, Elena Cianci, Alessio Lamperti, Claudia Wiemer, Silvia Baldovino, Luca Lamagna, Sabina Spiga, Marco Fanciulli, Guy Brammertz, Clement Merckling, Matty Caymax

Trimethylaluminum-based Atomic Layer Deposition of MO2 (M= Zr, Hf): Gate Dielectrics on In0. 53Ga0. 47As (001) Substrates

ECS Transactions [The Electrochemical Society], Volume: 50 Issue: 13 Pages: 11-19

A Molle, E Cianci, A Lamperti, C Wiemer, S Spiga, M Fanciulli

A Viable Route to Enhance Permittivity of Gate Dielectrics on In0. 53Ga0. 47As (001): Trimethylaluminum-Based Atomic Layer Deposition of MeO2 (Me= Zr, Hf)

ECS Journal of Solid State Science and Technology [The Electrochemical Society], Volume: 2 Issue: 9 Pages: P395-P399

Jean-Luc Battaglia, Vincent Schick, Andrzej Kusiak, Clément Rossignol, Claudia Wiemer, Alessio Lamperti

Identification of the temperature-dependent thermal boundary resistance at a metal-phase change material

Inverse Problems in Science and Engineering [Taylor & Francis Group], Volume: 20 Issue: 7 Pages: 941-950

Roberto Fallica, Flavio Volpe, Massimo Longo, Claudia Wiemer, Olivier Salicio, Adulfas Abrutis

Electronic properties of crystalline Ge1-xSbxTey thin films

Applied Physics Letters [AIP], Volume: 101 Issue: 10 Pages: 102105

E Ravizza, S Spadoni, R Piagge, P Comite, C Wiemer

XPS composition study of stacked Si oxide/Si nitride/Si oxide nano‐layers

Surface and Interface Analysis [John Wiley & Sons, Ltd], Volume: 44 Issue: 8 Pages: 1209-1213

S Spiga, R Rao, L Lamagna, C Wiemer, G Congedo, A Lamperti, A Molle, M Fanciulli, F Palma, F Irrera

Structural and electrical properties of atomic layer deposited Al-doped ZrO2 films and of the interface with TaN electrode

Journal of Applied Physics [AIP], Volume: 112 Issue: 1 Pages: 014107

C Wiemer, L Lamagna, M Fanciulli

Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications

Semiconductor Science and Technology [IOP Publishing], Volume: 27 Issue: 7 Pages: 074013

Alessandro Molle, Elena Cianci, Alessio Lamperti, Claudia Wiemer, Silvia Baldovino, Luca Lamagna, Sabina Spiga, Marco Fanciulli, Guy Brammertz, Clement Merckling, Matty Caymax

Trimethylaluminum-Based Atomic Layer Deposition of Al: MO2 (M= Zr, Hf): A Viable Route to Integrate High-Permittivity Oxides on In0. 53Ga0. 47As Substrates

Meeting Abstracts [The Electrochemical Society], Issue: 28 Pages: 2457-2457

Massimo Longo, Roberto Fallica, Claudia Wiemer, Olivier Salicio, Marco Fanciulli, Enzo Rotunno, Laura Lazzarini

Metal organic chemical vapor deposition of phase change Ge1Sb2Te4 nanowires

Nano letters [American Chemical Society], Volume: 12 Issue: 3 Pages: 1509-1515

Luca Lamagna, Claudia Wiemer, Michele Perego, Sabina Spiga, Jesus Rodriguez, David Santiago Coll, Maria Elena Grillo, Sylwia Klejna, Simon D Elliott

Mechanisms for substrate-enhanced growth during the early stages of atomic layer deposition of alumina onto silicon nitride surfaces

Chemistry of Materials [American Chemical Society], Volume: 24 Issue: 6 Pages: 1080-1090

L Lamagna, A Molle, C Wiemer, S Spiga, C Grazianetti, G Congedo, M Fanciulli

Atomic Layer Deposition of Al-Doped ZrO2 Thin Films as Gate Dielectric for In0. 53Ga0. 47As

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 159 Issue: 3 Pages: H220-H224

C Wiemer, A Debernardi, A Lamperti, A Molle, O Salicio, L Lamagna, M Fanciulli

Influence of lattice parameters on the dielectric constant of tetragonal ZrO2 and La-doped ZrO2 crystals in thin films deposited by atomic layer deposition on Ge (001)

Applied Physics Letters [AIP], Volume: 99 Issue: 23 Pages: 232907

Alessandro Molle, Luca Lamagna, Claudia Wiemer, Sabina Spiga, Marco Fanciulli, Clement Merckling, Guy Brammertz, Matty Caymax

Improved Performance of In0. 53Ga0. 47As-Based Metal–Oxide–Semiconductor Capacitors with Al: ZrO2 Gate Dielectric Grown by Atomic Layer Deposition

Applied physics express [IOP Publishing], Volume: 4 Issue: 9 Pages: 094103

C Wiemer, A Lamperti, L Lamagna, O Salicio, A Molle, M Fanciulli

Detection of the tetragonal phase in atomic layer deposited La-doped ZrO2 thin films on germanium

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 158 Issue: 8 Pages: G194-G198

W Gawelda, Jan Siegel, Carmen N Afonso, V Plausinaitiene, A Abrutis, C Wiemer

Dynamics of laser-induced phase switching in GeTe films

Journal of Applied Physics [AIP], Volume: 109 Issue: 12 Pages: 123102

Claudia Wiemer, Alessio Lamperti, Luca Lamagna, Olivier Salicio, Alessandro Molle, Marco Fanciulli

Detection of the Tetragonal and Monoclinic Phases and their Role on the Dielectric Constant of Atomic Layer Deposited La-Doped ZrO2 Thin Films on Ge (001)

ECS Transactions [The Electrochemical Society], Volume: 35 Issue: 3 Pages: 481-490

Luca Lamagna, Alessandro Molle, Claudia Wiemer, Sabina Spiga, Carlo Grazianetti, Marco Fanciulli

Atomic Layer Deposition of Al-Doped ZrO2 Thin Films for Advanced Gate Stack on III-V Substrates

ECS Transactions [The Electrochemical Society], Volume: 35 Issue: 3 Pages: 431-440

C Wiemer, S Baldovino, L Lamagna, M Perego, Sylvie Schamm-Chardon, M Fanciulli

Structural and electrical properties of Er-doped HfO 2 and of its interface with Ge (001)

Microelectronic Engineering [Elsevier], Volume: 88 Issue: 4 Pages: 415-418

Sylvie Schamm-Chardon, Pierre-Eugène Coulon, L Lamagna, C Wiemer, S Baldovino, M Fanciulli

Combining HRTEM–EELS nano-analysis with capacitance–voltage measurements to evaluate high-κ thin films deposited on Si and Ge as candidate for future gate dielectrics

Microelectronic Engineering [Elsevier], Volume: 88 Issue: 4 Pages: 419-422

M Longo, C Wiemer, O Salicio, M Fanciulli, L Lazzarini, E Rotunno

Au-catalyzed self assembly of GeTe nanowires by MOCVD

Journal of Crystal Growth [North-Holland], Volume: 315 Issue: 1 Pages: 152-156

V Schick, JL Battaglia, A Kusiak, C Rossignol, C Wiemer

Temperature dependant thermal and mechanical properties of a metal-phase change layer interface using the time resolved pump probe technique

Journal of Physics: Conference Series [IOP Publishing], Volume: 278 Issue: 1 Pages: 012024

L Lamagna, C Wiemer, M Perego, SN Volkos, S Baldovino, D Tsoutsou, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, M Fanciulli

O 3-based atomic layer deposition of hexagonal La 2 O 3 films on Si (100) and Ge (100) substrates

Journal of Applied Physics [AIP], Volume: 108 Issue: 8 Pages: 084108

Annalisa Del Vitto, Rossella Piagge, Enrica Ravizza, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Claudia Wiemer, Gabriella Ghidini, Mauro Alessandri, Marco Fanciulli, Jan Willem Maes, Mohith Verghese

Evaluation of HfLaOx as Blocking Layer for Innovative Nonvolatile Memory Applications

ECS Transactions [The Electrochemical Society], Volume: 33 Issue: 3 Pages: 417-424

Annalisa Del Vitto, Rossella Piagge, Enrica Ravizza, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Claudia Wiemer, Gabriella Ghidini, Mauro Alessandri, Marco Fanciulli, Jan Willem Maes, Mohith Verghese

LaHfOx Films Analyses for NVM Applications

Meeting Abstracts [The Electrochemical Society], Issue: 22 Pages: 1523-1523

Jan Siegel, D Puerto, J Solis, Francisco Javier García de Abajo, Carmen N Afonso, M Longo, C Wiemer, M Fanciulli, Paul Kühler, Mario Mosbacher, Paul Leiderer

Ultraviolet optical near-fields of microspheres imprinted in phase change films

Applied physics letters [AIP], Volume: 96 Issue: 19 Pages: 193108

C Wiemer, L Lamagna, S Baldovino, M Perego, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, O Salicio, G Congedo, S Spiga, M Fanciulli

Dielectric properties of Er− doped HfO 2 (Er∼ 15%) grown by atomic layer deposition for high-κ gate stacks

Applied Physics Letters [AIP], Volume: 96 Issue: 18 Pages: 182901

M Alessandri, A Del Vitto, R Piagge, A Sebastiani, C Scozzari, C Wiemer, L Lamagna, M Perego, G Ghidini, M Fanciulli

Rare earth-based high-k materials for non-volatile memory applications

Microelectronic Engineering [Elsevier], Volume: 87 Issue: 3 Pages: 290-293

J-L Battaglia, Andrzej Kusiak, Vincent Schick, Andrea Cappella, Claudia Wiemer, Massimo Longo, Enrico Varesi

Thermal characterization of the Si O 2-Ge 2 Sb 2 Te 5 interface from room temperature up to 400° C

Journal of Applied Physics [AIP], Volume: 107 Issue: 4 Pages: 044314

Jean-Luc Battaglia, Andrea Cappella, Enrico Varesi, Vincent Schick, Andrzej Kusiak, Claudia Wiemer, Andrea Gotti, Bruno Hay

Temperature-dependent thermal characterization of Ge2Sb2Te5 and related interfaces by the photothermal radiometry technique

Journal of Physics: Conference Series [IOP Publishing], Volume: 214 Issue: 1 Pages: 012102

M Perego, G Seguini, C Wiemer, M Fanciulli, PE Coulon, C Bonafos

Si nanocrystal synthesis in HfO2/SiO/HfO2 multilayer structures

Nanotechnology [IOP Publishing], Volume: 21 Issue: 5 Pages: 055606

L Lamagna, C Wiemer, S Baldovino, A Molle, M Perego, Sylvie Schamm-Chardon, Pierre-Eugène Coulon, M Fanciulli

Thermally induced permittivity enhancement in La-doped ZrO 2 grown by atomic layer deposition on Ge (100)

Applied Physics Letters [AIP], Volume: 95 Issue: 12 Pages: 122902

X Garros, Mikaël Casse, M Rafik, Claire Fenouillet-Béranger, Gilles Reimbold, F Martin, C Wiemer, F Boulanger

Process dependence of BTI reliability in advanced HK MG stacks

Microelectronics Reliability [Pergamon], Volume: 49 Issue: 9-11 Pages: 982-988

R Mantovan, C Wiemer, A Lamperti, A Zenkevich, Yu Lebedinski, M Fanciulli

Dehydrogenation at the Fe/Lu 2 O 3 interface upon rapid thermal annealing

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 321 Issue: 15 Pages: 2350-2353

R Mantovan, C Wiemer, A Lamperti, A Zenkevich, Yu Lebedinski, M Fanciulli

Dehydrogenation at the Fe/Lu2O3 interface upon rapid thermal annealing

Journal of Magnetism and Magnetic Materials [North-Holland], Volume: 321 Issue: 15 Pages: 2350-2353

C Gaumer, E Martinez, S Lhostis, C Wiemer, M Perego, V Loup, D Lafond, J-M Fabbri

Chemical and structural properties of a TaN/HfO2 gate stack processed using atomic vapor deposition

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 156 Issue: 7 Pages: G78-G83

Roberto Fallica, Jean-Luc Battaglia, Simone Cocco, Cristiano Monguzzi, Andrew Teren, Claudia Wiemer, Enrico Varesi, Raimondo Cecchini, Andrea Gotti, Marco Fanciulli

Thermal and electrical characterization of materials for phase-change memory cells

Journal of Chemical & Engineering Data [American Chemical Society], Volume: 54 Issue: 6 Pages: 1698-1701

XL Li, D Tsoutsou, G Scarel, C Wiemer, SC Capelli, SN Volkos, L Lamagna, M Fanciulli

Chemical and structural properties of atomic layer deposited La 2 O 3 films capped with a thin Al 2 O 3 layer

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films [AVS], Volume: 27 Issue: 2 Pages: L1-L7

O Salicio, C Wiemer, M Fanciulli, W Gawelda, Jan Siegel, Carmen N Afonso, V Plausinaitiene, A Abrutis

Effect of pulsed laser irradiation on the structure of GeTe films deposited by metal organic chemical vapor deposition: A Raman spectroscopy study

Journal of Applied Physics [AIP], Volume: 105 Issue: 3 Pages: 033520

S Schamm, Pierre-Eugène Coulon, S Miao, S No Volkos, mL H Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3∕ Si Interfaces for Advanced Gate Stacks

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 156 Issue: 1 Pages: H1-H6

S Schamm, PE Coulon, S Miao, SN Volkos, LH Lu, L Lamagna, C Wiemer, D Tsoutsou, G Scarel, M Fanciulli

Semiconductor Devices, Materials, and Processing-Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La2O3/Si Interfaces for Advanced Gate Stacks

Journal of the Electrochemical Society [], Volume: 156 Issue: 1 Pages: H1

C GAUMER, E MARTINEZ, S LHOSTIS, C WIEMER, M PEREGO, V LOUP, D LAFOND, J-M FABBRI

Chemical and Structural Properties of a TaN

Journal of the Electrochemical Society [Electrochemical Society], Volume: 156 Issue: 7

A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, W Gawelda, Jan Siegel, S Rushworth

Hot-wire chemical vapor growth and characterization of crystalline GeTe films

Journal of Crystal Growth [North-Holland], Volume: 311 Issue: 2 Pages: 362-367

A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, O Salicio, M Longo, A Pirovano, Jan Siegel, W Gawelda, S Rushworth, C Giesen

Chemical vapor deposition of chalcogenide materials for phase-change memories

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2338-2341

A Lamperti, S Spiga, HL Lu, C Wiemer, M Perego, E Cianci, M Alia, M Fanciulli

Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN)

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2425-2429

S Spiga, A Lamperti, C Wiemer, M Perego, E Cianci, G Tallarida, HL Lu, M Alia, FG Volpe, M Fanciulli

Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition

Microelectronic Engineering [Elsevier], Volume: 85 Issue: 12 Pages: 2414-2419

M Longo, O Salicio, C Wiemer, R Fallica, A Molle, M Fanciulli, C Giesen, B Seitzinger, PK Baumann, M Heuken, S Rushworth

Growth study of GexSbyTez deposited by MOCVD under nitrogen for non-volatile memory applications

Journal of Crystal Growth [North-Holland], Volume: 310 Issue: 23 Pages: 5053-5057

A Molle, S Spiga, Md NK Bhuiyan, G Tallarida, M Perego, C Wiemer, Marco Fanciulli

Atomic oxygen-assisted molecular beam deposition of Gd 2 O 3 films for ultra-scaled Ge-based electronic devices

Materials Science in Semiconductor Processing [Pergamon], Volume: 11 Issue: 5 Pages: 236-240

Sylvie Schamm, Pierre-Eugène Coulon, Shu Miao, Stelios N Volkos, L H Lu, Luca Lamagna, C Wiemer, Dimitra Tsoutsou, Giovanna Scarel, Marco Fanciulli

ALD-Grown Rare Earth Oxides for Advanced Gate Stacks

ECS Transactions [The Electrochemical Society], Volume: 13 Issue: 1 Pages: 77-88

Clement Gaumer, Eugenie Martinez, Sandrine Lhostis, Claudia Wiemer, Michele Perego, Virginie Loup, Dominique Lafond, Jean-Marc Fabbri

Interface Study in a" Metal/High-k" Gate Stack: Tantalum Nitride on Hafnium Oxide

ECS Transactions [The Electrochemical Society], Volume: 16 Issue: 5 Pages: 99-110

A Debernardi, C Wiemer, M Fanciulli

Epitaxial anatase HfO 2 on high-mobility substrate for ultra-scaled CMOS devices

Materials Science in Semiconductor Processing [Pergamon], Volume: 11 Issue: 5-6 Pages: 241-244

A Molle, S Spiga, Md NK Bhuiyan, G Tallarida, M Perego, C Wiemer, Marco Fanciulli

Atomic oxygen-assisted molecular beam deposition of Gd2O3 films for ultra-scaled Ge-based electronic devices

Materials Science in Semiconductor Processing [Pergamon], Volume: 11 Issue: 5-6 Pages: 236-240

HL Lu, G Scarel, C Wiemer, M Perego, S Spiga, M Fanciulli, G Pavia

Atomic layer deposition of NiO films on Si (100) using cyclopentadienyl-type compounds and ozone as precursors

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 155 Issue: 10 Pages: H807-H811

RJ Matyi, LE Depero, E Bontempi, P Colombi, A Gibaud, M Jergel, M Krumrey, TA Lafford, A Lamperti, M Meduna, A Van der Lee, C Wiemer

The international VAMAS project on X-ray reflectivity measurements for evaluation of thin films and multilayers—Preliminary results from the second round-robin

Thin Solid Films [Elsevier], Volume: 516 Issue: 22 Pages: 7962-7966

Adulfas Abrutis, Valentina Plausinaitiene, Martynas Skapas, Claudia Wiemer, Olivier Salicio, Agostino Pirovano, Enrico Varesi, Simon Rushworth, Wojciech Gawelda, Jan Siegel

Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications

Chemistry of Materials [American Chemical Society], Volume: 20 Issue: 11 Pages: 3557-3559

P Colombi, DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, C-H Chang, LE Depero, M Farnworth, T Fujimoto, A Gibaud, M Jergel, M Krumrey, TA Lafford, A Lamperti, T Ma, RJ Matyi, M Meduna, S Milita, K Sakurai, L Shabel'Nikov, A Ulyanenkov, A Van der Lee, C Wiemer

Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment

Journal of Applied Crystallography [International Union of Crystallography], Volume: 41 Issue: 1 Pages: 143-152

Jan Siegel, W Gawelda, D Puerto, Carlos Dorronsoro, J Solis, Carmen N Afonso, JCG De Sande, R Bez, A Pirovano, C Wiemer

Amorphization dynamics of Ge 2 Sb 2 Te 5 films upon nano-and femtosecond laser pulse irradiation

Journal of Applied Physics [AIP], Volume: 103 Issue: 2 Pages: 023516

Alessandro Molle, Claudia Wiemer, MDNK Bhuiyan, Grazia Tallarida, Marco Fanciulli

Epitaxial growth of cubic Gd2O3 thin films on Ge substrates

Journal of Physics: Conference Series [IOP Publishing], Volume: 100 Issue: 4 Pages: 042048

DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, CH Chang, P Colombi, LE Depero, M Farnworth, T Fujimoto, A Gibaud, M Jergel, M Krumrey, TA Lafford, A Lamperti, T Ma, RJ Matyi, M Meduna, S Milita, G Oliviero, K Sakurai, L Shabel'Nikov, A Ulyanenkov, A Van Der Lee, C Wiemer

Reproducability in X-Ray reflectometry: results from the first reflectivity round robin

Journal of Applied Crystallography [], Volume: 41 Pages: 143-15

Alberto Debernardi, Claudia Wiemer, Marco Fanciulli

Epitaxial phase of hafnium dioxide for ultrascaled electronics

Physical Review B [American Physical Society], Volume: 76 Issue: 15 Pages: 155405

Annalisa Del Vitto, Rossella Piagge, Massimo Caniatti, Claudia Wiemer, Giuseppe Pavia, Francesca Sammiceli, Enrica Ravizza, Salvatore Grasso, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Gabriella Ghidini, Christophe Pomarede, Jan Willem Maes, Mauro Alessandri

A Morphological, Chemical and Electrical Study of HfSiON Films for Inter Poly Dielectric Applications in Flash Memories

ECS Transactions [The Electrochemical Society], Volume: 11 Issue: 4 Pages: 497-508

Annalisa Del Vitto, Rossella Piagge, Massimo Caniatti, Claudia Wiemer, Giuseppe Pavia, Francesca Sammiceli, Enrica Ravizza, Salvatore Grasso, Simona Spadoni, Alessandro Sebastiani, Claudia Scozzari, Gabriella Ghidini, Christophe Pomarede, Jan Willem Maes, Mauro Alessandri

A Morphological, Chemical and Electrical Study of HfSiON Films Properties for Interpoly Dielectric Applications in Flash Memories

Meeting Abstracts [The Electrochemical Society], Issue: 20 Pages: 1160-1160

G Scarel, C Wiemer, M Fanciulli, IL Fedushkin, GK Fukin, GA Domrachev, Y Lebedinskii, A Zenkevich, G Pavia

[(Me3Si) 2N] 3Lu: Molecular Structure and Use as Lu and Si Source for Atomic Layer Deposition of Lu Silicate Films

Zeitschrift für anorganische und allgemeine Chemie [WILEY‐VCH Verlag], Volume: 633 Issue: 11‐12 Pages: 2097-2103

A Zenkevich, Yu Lebedinskii, S Spiga, C Wiemer, G Scarel, M Fanciulli

Effects of thermal treatments on chemical composition and electrical properties of ultra-thin Lu oxide layers on Si

Microelectronic engineering [Elsevier], Volume: 84 Issue: 9-10 Pages: 2263-2266

V Cosnier, P Besson, V Loup, L Vandroux, S Minoret, M Cassé, X Garros, JM Pedini, S Lhostis, K Dabertrand, C Morin, C Wiemer, M Perego, M Fanciulli

Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques

Microelectronic engineering [Elsevier], Volume: 84 Issue: 9-10 Pages: 1886-1889

Alessandro Molle, Michele Perego, Md Nurul Kabir Bhuiyan, Claudia Wiemer, Grazia Tallarida, Marco Fanciulli

The interface between Gd 2 O 3 films and Ge (001): A comparative study between molecular and atomic oxygen mediated growths

Journal of Applied Physics [AIP], Volume: 102 Issue: 3 Pages: 034513

J-L Battaglia, C Wiemer, M Fanciulli

An accurate low-frequency model for the 3 ω method

Journal of applied physics [AIP], Volume: 101 Issue: 10 Pages: 104510

Alessandro Molle, Claudia Wiemer, Md Nurul Kabir Bhuiyan, Grazia Tallarida, Marco Fanciulli, Giuseppe Pavia

Cubic-to-monoclinic phase transition during the epitaxial growth of crystalline Gd 2 O 3 films on Ge (001) substrates

Applied physics letters [AIP], Volume: 90 Issue: 19 Pages: 193511

G Scarel, C Wiemer, G Tallarida, S Spiga, G Seguini, E Bonera, M Fanciulli, Y Lebedinskii, A Zenkevich, G Pavia, IL Fedushkin, GK Fukin, GA Domrachev

Atomic layer deposition of Lu silicate films using [(Me3Si) 2N] 3Lu

Journal of The Electrochemical Society [The Electrochemical Society], Volume: 153 Issue: 11 Pages: F271-F276

Claudia Dallera, Francesca Fracassi, Lucio Braicovich, Giovanna Scarel, Claudia Wiemer, Marco Fanciulli, Giuseppe Pavia, Bruce CC Cowie

Nondestructive diagnostics of high-κ dielectrics for advanced electronic devices

Applied physics letters [AIP], Volume: 89 Issue: 18 Pages: 183521

Mauro Alessandri, Rossella Piagge, Massimo Caniatti, Annalisa Del Vitto, Claudia Wiemer, Giuseppe Pavia, Stefano Alberici, Enrico Bellandi, Angeloclaudio Nale

Structural and Chemical Investigation of Annealed Al2O3 Films for Interpoly Dielectric Application in Flash Memories

ECS Transactions [The Electrochemical Society], Volume: 3 Issue: 3 Pages: 183-192

S Ferrari, S Spiga, C Wiemer, M Fanciulli, A Dimoulas

Germanium diffusion during Hf O 2 growth on Ge by molecular beam epitaxy

Applied physics letters [AIP], Volume: 89 Issue: 12 Pages: 122906

Christian Monzio Compagnoni, Alessandro S Spinelli, Andrea Bianchini, Andrea L Lacaita, Sabina Spiga, Giovanna Scarel, Claudia Wiemer, Marco Fanciulli

Temperature dependence of transient and steady-state gate currents in Hf O 2 capacitors

Applied physics letters [AIP], Volume: 89 Issue: 10 Pages: 103504

SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia

Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism

Chemistry of materials [American Chemical Society], Volume: 18 Issue: 16 Pages: 3764-3773

Mauro Alessandri, Rossella Piagge, Stefano Alberici, Enrico Bellandi, Massimo Caniatti, Gabriella Ghidini, Alberto Modelli, Giuseppe Pavia, Enrica Ravizza, Alessandro Sebastiani, Claudia Wiemer, Sabina Spiga, Marco Fanciulli, Vincenzo Fiorentini, Emiliano Cadelano, Giorgia Maria Lopez

High-k materials in flash memories

ECS Transactions [The Electrochemical Society], Volume: 1 Issue: 5 Pages: 91-105

M Malvestuto, G Scarel, C Wiemer, M Fanciulli, F d’Acapito, F Boscherini

X-ray absorption spectroscopy study of Yb 2 O 3 and Lu 2 O 3 thin films deposited on Si (100) by atomic layer deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms [North-Holland], Volume: 246 Issue: 1 Pages: 90-95

M Malvestuto, G Scarel, C Wiemer, M Fanciulli, F d’Acapito, F Boscherini

X-ray absorption spectroscopy study of Yb2O3 and Lu2O3 thin films deposited on Si (1 0 0) by atomic layer deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms [North-Holland], Volume: 246 Issue: 1 Pages: 90-95

F d’Acapito, G Smolentsev, F Boscherini, M Piccin, G Bais, S Rubini, F Martelli, Alfonso Franciosi

Site of Mn in Mn δ-doped GaAs: X-ray absorption spectroscopy

Physical Review B [American Physical Society], Volume: 73 Issue: 3 Pages: 035314

Agostino Pirovano, Luca Perniola, Hiroshi Mizuta, Heike Riel, Damien Deleruyelle, Rainer Waser, Sidhu Maikap, Grazia Tallarida, Claudia Wiemer, Daniele Ielmini

Emerging non-volatile memories

IEDM Short Course [], Volume: 274 Issue: 5

Agostino Pirovano, Luca Perniola, Hiroshi Mizuta, Heike Riel, Damien Deleruyelle, Rainer Waser, Sidhu Maikap, Grazia Tallarida, Claudia Wiemer, Daniele Ielmini

Emerging non-volatile memories

IEDM Short Course [], Volume: 274 Issue: 5

G Brunoldi, S Guerrieri, SG Alberici, E Ravizza, G Tallarida, C Wiemer, T Marangon

Self-annealing and aging effect characterization on copper seed thin films

Microelectronic engineering [Elsevier], Volume: 82 Issue: 3-4 Pages: 289-295

S Spiga, C Wiemer, G Tallarida, G Scarel, S Ferrari, G Seguini, M Fanciulli

Effects of the oxygen precursor on the electrical and structural properties of Hf O 2 films grown by atomic layer deposition on Ge

Applied Physics Letters [AIP], Volume: 87 Issue: 11 Pages: 112904

S Kremmer, H Wurmbauer, C Teichert, G Tallarida, S Spiga, C Wiemer, M Fanciulli

Nanoscale morphological and electrical homogeneity of HfO 2 and ZrO 2 thin films studied by conducting atomic-force microscopy

Journal of applied physics [AIP], Volume: 97 Issue: 7 Pages: 074315

Jean-Luc Battaglia, A Kusiak, C Rossignol, Christophe Pradere, Jean-Christophe Batsale, A Sommier, C Wiemer, R Fallica, M Longo, V Sousa

THERMAL PROPERTIES MEASUREMENTS OF PHASE-CHANGE ALLOYS WITHIN THE CONFIGURATION OF NANOSTRUCTURES AND DEVICES

International Heat Transfer Conference Digital Library [Begel House Inc.],

M Zanuccoli, C Fiegna, E Cianci, C Wiemer, A Lamperti, G Tallarida, L Lamagna, S Losa, S Rossini, F Vercesi, I Semenikhin

Simulation of micro-mirrors for optical MEMS

2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) [IEEE], Pages: 81-84

M Longo, S Cecchi, S Selmo, M Fanciulli, C Wiemer, J-L Battaglia, A Saci, A Kusiak

MOCVD growth and thermal analysis of Sb2Te3thin films and nanowires

2015 1st Workshop on Nanotechnology in Instrumentation and Measurement (NANOFIM) [IEEE], Pages: 150-154

M Longo, S Cecchi, S Selmo, M Fanciulli, C Wiemer, J-L Battaglia, A Saci, A Kusiak

MOCVD growth and thermal analysis of Sb2Te3thin films and nanowires

2015 1st Workshop on Nanotechnology in Instrumentation and Measurement (NANOFIM) [IEEE], Pages: 150-154

Jaan Aarik, Andrew R Akbashev, Mikhael Bechelany, Maria Berdova, David Cameron, Nikolai Chekurov, Viktor Drozd, Simon Elliott, Gloria Gottardi, Kestutis Grigoras, Marcel Junige, Tanja Kallio, Jaana Kanervo, Yury Koshtyal, Marja-Leena Kääriäinen, Tommi Kääriäinen, Luca Lamagna, Anatoly Malkov, Anatoly Malygin, Jyrki Molarius, Cagla Ozgit-Akgun, Henrik Pedersen, Riikka L Puurunen, Alexander Pyymaki-Perros, Robin HA Ras, Fred Roozeboom, Timo Sajavaara, Hele Savin, Thomas E Seidel, Pia Sundberg, Jonas Sundqvist, Massimo Tallarida, J Ruud van Ommen, Thomas Wächtler, Claudia Wiemer, Oili Ylivaara

Overview of early publications on atomic layer deposition

14th International Conference on Atomic Layer Deposition, ALD 2014 [American Vacuum Society AVS],

Huu Tan Nguyen, Andrzej Kusiak, Jean Luc Battaglia, Cecile Gaborieau, Yanick Anguy, Roberto Fallica, Claudia Wiemer, Alessio Lamperti, Massimo Longo

Thermal Properties of In-Sb-Te Thin Films for Phase Change Memory Application

Advances in Science and Technology [Trans Tech Publications], Volume: 95 Pages: 113-119

X Garros, M Casse, C Fenouillet-Beranger, G Reimbold, F Martin, C Gaumer, C Wiemer, M Perego, F Boulanger

Detrimental impact of technological processes on BTI reliability of advanced high-k/metal gate stacks

2009 IEEE International Reliability Physics Symposium [IEEE], Pages: 362-366

U Russo, Daniele Ielmini, Carlo Cagli, ANDREA LEONARDO Lacaita, Silvia Spiga, C Wiemer, M Perego, M Fanciulli

Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM

2007 IEEE International Electron Devices Meeting [IEEE], Pages: 775-778

J Siegel, D Puerto, J Solis, CN Afonso, R Bez, A Pirovano, C Wiemer

Amorphization dynamics of Ge 2 Sb 2 T3 5 films under nano-and femtosecond laser pulse irradiation

Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on [IEEE], Pages: 1-1

J Siegel, D Puerto, J Soils, CN Afonso, R Bez, A Pirovano, C Wiemer

Amorphization dynamics of Ge2Sb2Te5 films under nano- and femtosecond laser pulse irradiation

The European Conference on Lasers and Electro-Optics [Optical Society of America], Pages: CC4_5

A Cappella, J-L Battaglia, V Schick, A Kusiak, C Wiemer, M Longo, B Hay

Photothermal Radiometry applied in nanoliter melted tellurium alloys

Materials Challenges and Testing for Supply of Energy and Resources [Springer, Berlin, Heidelberg], Pages: 273-283

R Mantovan, C Wiemer, A Lamperti, M Georgieva, M Fanciulli, A Goikhman, N Barantsev, Yu Lebedinskii, A Zenkevich

Mössbauer spectroscopy study of interfaces for spintronics

ISIAME 2008 [Springer, Berlin, Heidelberg], Pages: 371-376

S Spiga, C Wiemer, G Scarel, G Seguini, M Fanciulli, A Zenkevich, Yu Lebedinskii

Physical, Chemical, and Electrical Characterization of High-κ Dielectrics on Ge and GaAs

Advanced Gate Stacks for High-Mobility Semiconductors [Springer, Berlin, Heidelberg], Pages: 181-209

Sabina Spiga, Claudia Wiemer, Giovanna Scarel, Omar Costa, Marco Fanciulli

Electrical characterization of rare earth oxides grown by atomic layer deposition

Rare Earth Oxide Thin Films [Springer, Berlin, Heidelberg], Pages: 203-223

R Mantovan, C Wiemer, A Zenkevich, M Fanciulli

CEMS characterisation of Fe/high-κ oxide interfaces

ICAME 2005 [Springer, Berlin, Heidelberg], Pages: 1349-1353